Intermetallic Coating Deposition for Low-Temperature Color Control
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Solution Overview
Problem
The implementation of thin layers of intermetallic compounds in watchmaking and jewelry is hindered by their amorphous phase, which lacks the desired color and requires a lengthy and complex annealing process to achieve crystallinity, making them difficult to use effectively due to their brittleness and the risk of substrate deformation during high-temperature processing.
Innovation Solution
A process for depositing thin intermetallic layers at low temperatures (below 100°C) using PVD methods like cathodic sputtering or co-evaporation, eliminating the need for annealing and allowing for the direct achievement of desired colors in a mainly amorphous phase, with optional localized annealing for color contrast and the use of composite targets or dielectric layers for protection and aesthetic enhancement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If annealing is performed to crystallize the intermetallic layer and achieve desired color, then the color quality is improved, but the production time increases and substrates may deform due to high temperature
Solution Approach 1:
The patent changes the deposition parameters (temperature, pressure, gas composition) to directly produce intermetallic layers with the desired crystalline structure and color in the as-deposited state, eliminating the need for post-deposition annealing. The deposition is performed at controlled temperatures and pressures that promote direct formation of the colored crystalline phase.
Solution Approach 2:
The patent performs the crystallization action during the deposition process itself rather than as a separate subsequent step. The intermetallic layer is formed with the desired crystalline structure and color directly during deposition, so the coloring action is performed preliminarily before any annealing would be needed.
2Manufacturing precision
If annealing is performed to crystallize the intermetallic layer, then the color quality is improved, but the device complexity increases due to additional processing steps
Solution Approach 1:
The patent merges the deposition and crystallization steps into a single integrated process. The intermetallic layer is deposited and simultaneously crystallized with the desired color-forming structure during the same deposition cycle, eliminating the need for separate annealing equipment and process steps.
Solution Approach 2:
By adjusting deposition parameters (temperature, pressure, gas composition, deposition rate), the process directly produces the desired crystalline phase and color during deposition, eliminating the need for additional annealing equipment and process control systems.
3Manufacturing precision
If high temperature annealing is used to crystallize the intermetallic layer, then the color is improved, but temperature-sensitive substrates may be damaged
Solution Approach 1:
The patent changes the temperature parameter from high-temperature annealing to controlled low-temperature deposition. By optimizing deposition temperature, pressure, and gas composition, the process achieves direct formation of colored crystalline intermetallic layers without subjecting temperature-sensitive substrates to damaging high temperatures.
4Ease of manufacture
If conventional deposition methods are used, then the intermetallic layer can be deposited, but the layer remains amorphous and lacks desired color
Solution Approach 1:
The patent modifies deposition parameters (temperature, pressure, gas composition, deposition rate) to transition from producing amorphous layers to directly forming crystalline intermetallic phases with desired colors. The controlled atmosphere and temperature promote direct crystallization during deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces production time, enables the use of temperature-sensitive substrates, and allows for reproducible color achievement without the need for extensive annealing, while also providing a protective layer to maintain the color and durability of the intermetallic layers.
Implementation Method 1
The step of depositing the thin intermetallic layer is carried out by implementing a PVD deposition method from among cathode or ion sputtering, thermal evaporation, beam evaporation electron or arc, or pulsed laser beam ablation
Implementation Method 2
cathode or ion sputtering
Implementation Method 3
thermal evaporation
Implementation Method 4
pulsed laser beam ablation
Data Source
Figure 1
AI summary
The invention relates to a method of depositing a coating on a substrate (100), said method being characterized in that it comprises a step of depositing a thin intermetallic layer (110) on said substrate (100), so as to obtain, at the end of this step, a covering part (10) having a predetermined final color.