Intersecting Channel Dosing Unit for Plasma Layer Deposition
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Solution Overview
Problem
Existing coating technologies face challenges in efficiently depositing homogeneous and dense layers on substrates with low thermal energy input, particularly in normal-pressure plasma processes, and require improved metering units for precursors in gas streams to enhance layer deposition quality and reduce energy consumption.
Innovation Solution
A dosing unit with a base body having intersecting channels for precise precursor injection into a gas stream, incorporating a particle trap and adjustable angle for optimal particle capture, allowing for low-throughput dosing and varying particle sizes, enabling efficient precursor delivery in plasma or flame processes without contaminating plasma electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a flame or plasma jet is generated from a working gas with precursor introduction to deposit homogeneous and dense layers, then coating quality is improved, but thermal energy input increases
Solution Approach 1:
The patent introduces a dosing unit with intersecting channels as an intermediary device between the precursor source and the plasma jet. This device enables precise precursor metering into the gas stream without requiring high thermal energy input, thereby achieving homogeneous layer deposition while reducing energy consumption compared to direct flame or plasma jet methods
2Productivity
If precursors are metered into gas streams using conventional methods, then coating processes can be performed, but particle contamination occurs on plasma electrodes
Solution Approach 1:
The patent extracts the harmful function of particle contamination from the system by designing the dosing unit to separate precursor injection from the plasma electrode area. The intersecting channel design allows precursors to be introduced into the gas stream away from electrodes, preventing contamination while maintaining coating process efficiency
3Loss of substance
If low-throughput dosing is used for precise precursor delivery, then precursor consumption is reduced, but dosing precision becomes more difficult to maintain
Solution Approach 1:
The patent implements dynamic control of precursor dosing through the intersecting channel design, where the angle and geometry of channel intersection can be optimized to maintain precise dosing even at low throughput rates. The design allows the system to adapt precursor delivery to match actual process requirements, maintaining dosing precision while reducing overall precursor consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient deposition of layers with controlled particle sizes and properties, reducing energy consumption and extending plasma quality by preventing electrode contamination, allowing for flexible integration in various coating processes, including atmospheric pressure applications.
Implementation Method 1
a first channel (3) through which a gas flow (G) can flow from a gas inlet (4) to a gas outlet (5)
Implementation Method 2
a plasma jet or a flame is generated from a working gas, into which a precursor is introduced... the precursor is reacted in the plasma jet or in the flame, with at least one reaction product of at least one of the precursors being deposited on a surface of the substrate
Implementation Method 3
a plasma jet or a flame is generated from a working gas, into which a precursor is introduced... the precursor is reacted in the plasma jet or in the flame
Data Source
Figure 1
AI summary
Dosing unit (1) for dosing a precursor into a gas stream, comprises a base body (2) with a first channel (3), which is led from a gas inlet (4) to a gas outlet (5) from the gas stream, and a second channel, which intersects the first channel at an angle (alpha ) at an intersection point. A spray nozzle is arranged in the second channel for supplying the precursor into the gas stream. Independent claims are also included for: (1) a dosing arrangement comprising at least two dosing units, where the dosing units are connected in series in the same gas stream such that many precursors are successively supplied to the gas stream; and (2) depositing a layer on a substrate, comprising producing a plasma jet or a flame from an operating gas, supplying at least one precursor to at least one gas stream into the dosing unit or the dosing arrangement, supplying the gas streams, which are loaded with the precursor to the operating gas, the plasma jet and/or the flame, and reacting the precursor in the plasma jet and the flame, where at least one reaction product of at least one of the precursors is deposited on a surface of the substrate and/or at least on the layer, which is arranged on the surface.