Intracranial EEG Electrode Placement Using Seizure Propagation Models
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Solution Overview
Problem
The identification of epileptogenic zones in epileptic patients' brains is challenging due to the need for invasive electrode implantation, which requires optimizing the placement of electrodes to maximize information gathering while minimizing invasiveness, and existing methods often result in sparse data or unnecessary electrodes.
Innovation Solution
A method and system using a personalized computerized platform to simulate electrode implantation schemes, incorporating models of epileptogenic zones and seizure propagation, and optimizing electrode placement based on metrics like power density spectrum to identify an optimal implantation scheme.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the number of intracranial electrodes is increased to improve seizure data coverage, then measurement precision is improved, but surgical risk and device complexity increase
Solution Approach 1:
The patent applies preliminary action by using a computerized platform to simulate and evaluate multiple electrode implantation schemes before the actual surgery. The system models the patient's brain anatomy and seizure propagation patterns, then virtually tests different electrode configurations to predict which schemes will provide adequate seizure data coverage. This pre-surgical simulation allows clinicians to select an optimized implantation scheme that achieves sufficient measurement precision with fewer electrodes, thereby reducing surgical risk.
2Loss of information
If more electrodes are implanted to capture comprehensive brain activity, then information completeness is improved, but device complexity and surgical invasiveness worsen
Solution Approach 1:
The patent applies parameter changes by using the computerized simulation platform to evaluate and compare multiple implantation schemes with different electrode configurations. The system varies parameters such as electrode number, placement locations, and depth to identify the optimal configuration that achieves sufficient information completeness about seizure propagation patterns. By simulating and comparing different parameter combinations, the system determines the minimum number of electrodes needed to capture essential brain activity information, thus reducing device complexity while maintaining information completeness.
3Measurement precision
If electrode placement is optimized to maximize information gain, then measurement precision is improved, but the complexity of determining the optimal scheme increases
Solution Approach 1:
The patent applies copying by creating a virtual copy of the patient's brain anatomy and seizure patterns in a computerized simulation platform. This digital model replicates the essential features of the patient's brain structure and epileptic activity, allowing clinicians to test and evaluate multiple electrode implantation schemes in silico. The simulation copies the patient-specific anatomy and seizure propagation patterns, enabling optimization of electrode placement to maximize information gain without requiring complex manual calculations or trial-and-error approaches.
Data Source
AI summary
The method of optimizing an intracranial implantation scheme of a set of electroencephalographic electrodes for identification of an epileptogenic zone in an epileptic patient's brain includes: —providing a model of the epileptogenic zone and a model of the propagation of an epileptic discharge from the epileptic zone to a propagation zone, and loading the models in a computerized platform personalized according to the patient's brain; —providing at least one hypothesis of the localization of the epileptogenic zone in the patient brain; —for the at least hypothesis of the localization of the epileptogenic zone, simulating, in the personalized computerized patient's brain, epileptic seizures, and determining, for the hypothesis and epileptic seizures, a network of propagation zones; —for a plurality of intracranial implantation schemes of the electroencephalographic electrodes, obtaining, using the personalized computerized patient's brain, simulated electroencephalographic signals activity to be measured by the intracranial electrodes implanted according to the plurality of schemes; and —determining, from the plurality of schemes, an optimized intracranial implantation scheme of the set of electroencephalographic electrodes.