Oxide Semiconductor Logic Circuit for Stable Low-Leakage Switching

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Solution Overview

Problem

Conventional transistors often experience leakage current issues when in the off state, leading to malfunction in logic circuits, especially in display devices where precise voltage control is crucial.

Innovation Solution

The use of a transistor with an oxide semiconductor layer as the channel formation layer, which is highly purified to be intrinsic or substantially intrinsic, reducing the leakage current and minimizing the impact of threshold voltage variations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional transistors are used in logic circuits, then manufacturing is easier and device complexity is lower, but leakage current increases causing malfunction

Engineering Contradiction:
Improvelogic circuit operation stabilityVSAvoidleakage current
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent changes the material parameter of the transistor channel from conventional semiconductor to oxide semiconductor, which fundamentally alters the electrical characteristics to achieve ultra-low leakage current while maintaining acceptable manufacturing complexity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs oxide semiconductor materials (such as In-Ga-Zn-O) as composite material in the channel formation layer, combining multiple elements to achieve desired electrical properties including low leakage current and stable threshold voltage

Inventive Principle:
Principle #40Composite materials

2Reliability

If oxide semiconductor transistors are used, then leakage current is reduced and reliability is improved, but manufacturing precision requirements increase

Engineering Contradiction:
Improveoff current suppressionVSAvoidoxide semiconductor layer purity
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent performs preliminary purification of the oxide semiconductor material before device fabrication, removing impurities that would act as electron donors and cause leakage current, thereby ensuring high material purity prior to manufacturing steps

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent applies different quality requirements to different regions of the oxide semiconductor layer, with the channel formation region requiring highest purity to minimize leakage current, while other regions can have relaxed specifications

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS20250169184A1Logic circuit and semiconductor device
Publication Date: 2025.05.22 SEMICON ENERGY LAB CO LTD
  • US20250169184A1 patent drawing
  • US20250169184A1 patent drawing
  • US20250169184A1 patent drawing

AI summary

To reduce a leakage current of a transistor so that malfunction of a logic circuit can be suppressed. The logic circuit includes a transistor which includes an oxide semiconductor layer having a function of a channel formation layer and in which an off current is 1×10−13 A or less per micrometer in channel width. A first signal, a second signal, and a third signal that is a clock signal are input as input signals. A fourth signal and a fifth signal whose voltage states are set in accordance with the first to third signals which have been input are output as output signals.