Invariable and Programmable Reticle Combination for Flexible Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current photolithographic processes for exposing structures on substrates are either slow and expensive when using electron beam or ion beam writing, or they require multiple invariable reticles, which is inflexible and costly.
Innovation Solution
A method and apparatus that combine an invariable reticle and a programmable reticle in the light path between a light source and a substrate, allowing for flexible exposure of structures by adjusting the programmable reticle's transparency to expose different patterns, enabling smaller structure sizes and efficient use of reticles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If electron beam or ion beam writing is used for exposure, then exposure flexibility is improved, but exposure speed decreases and cost increases
Solution Approach 1:
The patent combines an invariable reticle with a programmable reticle in a single exposure system. The invariable reticle provides the base pattern while the programmable reticle overlays variable patterns, merging the advantages of both approaches to achieve both speed and flexibility.
Solution Approach 2:
The programmable reticle serves multiple functions: it can be programmed with different patterns for different exposures, act as a mask for specific regions, and work in combination with the invariable reticle. This multi-functionality replaces the need for multiple specialized reticles while maintaining high exposure speed.
2Manufacturing precision
If multiple invariable reticles are used for exposing different layers, then exposure precision is maintained, but device complexity and cost increase
Solution Approach 1:
The patent introduces a programmable reticle that can be dynamically reconfigured between exposures. Instead of using multiple static invariable reticles, the system uses one programmable reticle that adapts its pattern for each exposure layer, reducing physical reticle inventory and management complexity.
Solution Approach 2:
The programmable reticle changes its transmission pattern parameters (transparent/opaque regions) based on the required exposure pattern. This allows a single reticle to perform the function of multiple invariable reticles by changing its programmed state rather than physically replacing reticles.
3Productivity
If invariable reticles are used for all exposures, then exposure speed is maintained, but adaptability to different structures decreases
Solution Approach 1:
The patent segments the reticle function into two parts: an invariable reticle that handles the common, high-speed exposure patterns and a programmable reticle that handles variable patterns. This segmentation allows the system to maintain high speed for routine exposures while adding flexibility when needed.
Solution Approach 2:
The programmable reticle acts as an intermediary between the light source and the substrate, introducing variable patterns only where needed. It mediates between the fixed invariable reticle and the specific exposure requirements, adding adaptability without compromising the overall exposure speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables fast and cost-effective exposure of various structures on substrates, allowing for smaller feature sizes and flexible design changes without the need for multiple reticles, improving manufacturing efficiency and reducing costs.
Implementation Method 1
exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle
Data Source
AI summary
A method for exposing a structure on a substrate includes positioning of an invariable reticle and a programmable reticle in a light path between a light source and a layer on a substrate to be exposed to light and exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle.