Inverted Concave Cleaning Member for Film Deposition Susceptor

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Solution Overview

Problem

In film deposition apparatuses, deposits on the susceptor can lead to particle generation, and existing cleaning methods using corrosive gases pose a risk of corroding the chamber's inner surface, increasing production costs.

Innovation Solution

A film deposition apparatus with a susceptor and a cleaning method that utilize a cleaning gas supplied to a defined space above the susceptor, evacuated through a gas passage, minimizing exposure to the inner chamber surface, and a cleaning nozzle configuration that prevents the cleaning gas from spreading to the chamber's interior.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a cleaning gas is supplied to clean the susceptor, then deposits on the susceptor are removed, but the cleaning gas may corrode the inner surface of the chamber

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidcorrosion of chamber inner surface

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The cleaning process is segmented into a specific spatial zone using the inverted concave member to define a cleaning space. This segmentation allows the cleaning gas to be confined to a localized area above the susceptor, preventing it from contacting and corroding the chamber's inner surface while maintaining effective cleaning of the susceptor deposits.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The inverted concave member creates a localized cleaning environment with distinct properties. Within this local space, the cleaning gas can exert its full corrosive effect on deposits without affecting the broader chamber environment. The structure provides different functional zones: a cleaning zone above the susceptor and a protected zone for the chamber interior.

Inventive Principle:

Principle #3Local quality

2Object-affected harmful factors

If the chamber is made of anti-corrosive materials or coated with anti-corrosive materials to prevent corrosion, then the chamber is protected from cleaning gas, but the production cost increases

Engineering Contradiction:

Improveprotection from corrosionVSAvoidproduction cost

Core Design Contradiction:

Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The inverted concave member acts as an intermediary structure between the cleaning gas and the chamber interior. Rather than modifying the chamber itself with expensive anti-corrosive materials or coatings, this intermediary component provides physical containment for the cleaning gas, achieving corrosion protection through structural design instead of material substitution.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Reliability

If the cleaning gas is supplied to the chamber to clean the susceptor, then deposits are removed, but the cleaning gas may spread to the chamber interior causing corrosion

Engineering Contradiction:

Improvedeposit removalVSAvoidspreading of cleaning gas to chamber interior

Core Design Contradiction:

ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The inverted concave member functions as a structural barrier that confines the cleaning gas to a specific region. This shell-like structure creates a physical boundary that prevents the cleaning gas from freely spreading to the chamber interior, while still allowing the cleaning process to effectively reach the susceptor surface through the defined opening.

Inventive Principle:

Principle #30Flexible shells and thin films

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively removes deposits from the susceptor without corroding the chamber's inner surface, reducing maintenance costs and improving production throughput by concentrating the cleaning gas within a controlled space.

Implementation Method 1

A cleaning gas to be used for cleaning the susceptor may be used for etching, for example, a silicon oxide film or a silicon nitride film

Methodology Applied

Scientific EffectChemical reaction: Chemical Bonding

Implementation Method 2

an evacuation pipe configured to be in gaseous communication with the gas passage and to extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber

Methodology Applied

Scientific EffectEvacuation: Vacuum

Data Source

PatentUS8944077B2Film deposition apparatus, cleaning method for the same, and computer storage medium storing program

Publication Date: 2015.02.03 TOKYO ELECTRON LTD

AI summary

A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.