Inverted Image Slicer for Lithographic Beam Separation
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Solution Overview
Problem
Conventional lithographic apparatuses face challenges in reducing the separation between radiation beams while maintaining beam cross-section and accuracy, as demagnification optics can reduce beam cross-section and increase pointing errors.
Innovation Solution
An exposure apparatus using an image slicer in an inverted configuration to adjust radiation beam paths, allowing beams to be brought closer together without affecting their cross-section, by inputting each beam at a location corresponding to a separated image region, thereby reducing the separation between adjacent beams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Length of stationary object
If demagnification optics are used to reduce the separation between radiation beams, then the separation between beams is reduced, but the cross-section of each beam is also reduced and pointing accuracy deteriorates
Solution Approach 1:
The patent applies segmentation by dividing the optical system into separate optical columns, each handling individual radiation beams independently. This allows beams to be separated spatially in the optical domain while maintaining their individual cross-sections, then recombined at the substrate plane without the need for demagnification optics that would compromise beam quality.
2Length of stationary object
If demagnification optics are used to reduce the separation between radiation beams, then the separation between beams is reduced, but the pointing accuracy of the beams increases (worsens)
Solution Approach 1:
The patent transitions the problem from a one-dimensional separation reduction task to a multi-dimensional solution by using separate optical columns arranged in space. This allows beam separation to be managed in the optical path dimension while maintaining beam quality, and the final projection onto the substrate occurs in a different spatial dimension where high resolution is achieved without compromising pointing accuracy.
3Manufacturing precision
If the separation between radiation beams is reduced to achieve high resolution, then resolution is improved, but the physical space required for beam control devices increases
Solution Approach 1:
The patent implements multi-functionality by designing optical columns that can handle multiple radiation beams within a compact footprint. Each optical column is designed to accommodate beam generation, steering, and focusing functions in an integrated manner, reducing the overall space required while maintaining the ability to control multiple beams independently for high-resolution patterning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables a higher resolution by reducing the separation between radiation beams while maintaining beam cross-section and accuracy, improving the efficiency of pattern projection on substrates.
Implementation Method 1
an image slicer used in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions
Data Source
AI summary
An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.