Iodinated Aromatic Metal Salt Resist for EUV Lithography
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Solution Overview
Problem
EUV lithography resist materials face challenges in achieving high sensitivity and low line width roughness (LWR) and critical dimension uniformity (CDU) due to the tradeoff between sensitivity and acid diffusion, with existing solutions either reducing sensitivity or increasing acid diffusion, leading to image blur and pattern defects.
Innovation Solution
Incorporating a metal salt of an iodinated aromatic group-containing carboxylic acid into the resist composition, which absorbs EUV light and generates secondary electrons to enhance acid generation efficiency while suppressing acid diffusion, thereby improving sensitivity and LWR/CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the acid diffusion distance is reduced by lowering PEB temperature or increasing quencher amount, then LWR is reduced, but sensitivity becomes lower
Solution Approach 1:
The invention changes the chemical parameters of the quencher by using a metal salt of carboxylic acid with specifically designed molecular structure and pKa value (5-10), creating optimal balance between acid diffusion control and sensitivity maintenance
Solution Approach 2:
The invention uses a composite quencher system combining metal salt of carboxylic acid with specific molecular weight (500-5000) and pKa characteristics, creating a material that simultaneously provides acid diffusion control while maintaining high sensitivity
2Manufacturing precision
If conventional metal salt of carboxylic acid or metal complex of β-diketone is used as quencher, then acid diffusion is controlled, but sensitivity is not improved
Solution Approach 1:
The invention optimizes key parameters of the quencher including pKa value (5-10) and molecular weight (500-5000), creating a metal salt of carboxylic acid that outperforms conventional quenchers in both acid diffusion control and sensitivity
Solution Approach 2:
The invention introduces specific local chemical characteristics to the quencher molecule, including carboxylic acid functional groups and controlled molecular weight distribution, creating localized acid-trapping zones that enhance both diffusion control and sensitivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition exhibits high sensitivity, minimal LWR, and improved CDU, with the iodinated aromatic carboxylic acid metal salt effectively trapping acid and reducing diffusion, leading to enhanced pattern resolution and contrast.
Implementation Method 1
the iodinated aromatic carboxylic acid metal salt effectively trapping acid and reducing diffusion, leading to enhanced pattern resolution and contrast
Implementation Method 2
The acid generated from the acid generator upon light exposure undergoes ion exchange with the metal salt of carboxylic acid or metal complex of β-diketone. That is, the acid is trapped
Data Source
AI summary
A resist composition comprising a base polymer and a metal salt of an iodinated aromatic group-containing carboxylic acid, the metal being selected from among sodium, magnesium, potassium, calcium, rubidium, strontium, cesium, barium, cobalt, nickel, copper, zinc, cadmium, tin, antimony, zirconium, hafnium, cerium, aluminum, and indium, exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.