Resist Composition with Iodinated Salt Quenchers for LWR and CDU
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Solution Overview
Problem
Existing resist compositions face challenges in achieving high sensitivity, reduced line width roughness (LWR), and critical dimension uniformity (CDU) due to issues with acid diffusion and light contrast limitations in advanced lithography processes like ArF and EUV lithography, particularly in the formation of line and hole patterns.
Innovation Solution
Incorporation of a salt compound derived from a nitrogen-containing compound with an iodine-substituted aromatic ring and a fluorinated 1,3-diketone, fluorinated β-keto ester, or fluorinated imide compound as a quencher in the resist composition, which suppresses acid diffusion and enhances sensitivity, leading to improved LWR and CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional quenchers (amine compounds or iodine-substituted aniline compounds) are used to control acid diffusion, then acid diffusion control is achieved, but sensitivity is insufficient and LWR/CDU cannot be reduced adequately
Solution Approach 1:
The patent changes the chemical parameters of the quencher by introducing a specific salt compound with a nitrogen-containing compound having an iodine-substituted aromatic ring. This structural modification optimizes both the acid diffusion control capability and the sensitivity, resolving the contradiction between manufacturing precision and reliability.
Solution Approach 2:
The patent uses a composite quencher structure combining iodine-substituted aromatic ring with specific functional groups (fluorinated 1,3-diketone, fluorinated β-keto ester, or fluorinated imide compound). This composite structure provides both high sensitivity through iodine's light absorption and effective acid diffusion control through the basic nitrogen-containing structure.
2Measurement precision
If acid diffusion is controlled using existing quencher structures, then resolution is improved, but line width roughness and critical dimension uniformity remain problematic
Solution Approach 1:
The patent modifies the quencher's chemical parameters by introducing the specific salt compound structure with iodine-substituted aromatic ring and fluorinated functional groups. This optimization simultaneously improves resolution and reduces LWR/CDU, addressing the contradiction between measurement precision and manufacturing precision.
3Reliability
If fluorinated sulfonic acid generators are used to achieve deprotection reaction, then pattern formation is enabled, but ion exchange occurs with non-fluorinated sulfonic acid generators reducing quencher effectiveness
Solution Approach 1:
The patent introduces a specific salt compound as an intermediary quencher that does not participate in ion exchange reactions with the fluorinated sulfonic acid generator. The nitrogen-containing compound with iodine-substituted aromatic ring serves as a stable mediator that maintains quencher effectiveness while allowing the acid generator to function properly.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition exhibits high sensitivity, reduced LWR, improved CDU, and enhanced resolution with wider process margins, effectively addressing the limitations of conventional quenchers in controlling acid diffusion and maintaining pattern fidelity.
Implementation Method 1
the salt compound has a capability for suppressing acid diffusion in a resist film
Implementation Method 2
the salt compound has a sensitizing effect due to a lack of photosensitivity, is not decomposed even in an exposed region
Implementation Method 3
the salt compound which is obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound
Data Source
AI summary
A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.