Iodine-Containing Cyclic Compound for Uniform Miniaturized Resist Patterns
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Solution Overview
Problem
Existing lithography compositions struggle to meet the demands of miniaturization in semiconductor and liquid crystal display element production, requiring materials that can form resist patterns with improved CD uniformity and etching resistance.
Innovation Solution
A compound represented by formula (1) with specific structural features, including a cyclic group containing an iodine atom and monovalent functional groups, is used in a lithography composition, potentially combined with other compounds to enhance sensitizing effects and solubility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing lithography compositions are used, then current manufacturing capabilities are maintained, but they cannot meet the demands of miniaturization in semiconductor and liquid crystal display element production
Solution Approach 1:
The patent introduces a compound with a specific molecular structure containing an iodine atom and a cyclic group, changing the chemical parameters of the lithography composition to achieve improved CD uniformity and etching resistance, thereby enabling miniaturization while maintaining pattern formation reliability
Solution Approach 2:
The patent combines the iodine-containing cyclic compound with other compounds to create a composite lithography composition that synergistically improves both manufacturing precision for miniaturization and the reliability of resist pattern formation
2Reliability
If a compound with improved sensitizing effect is used, then lithography performance is enhanced, but solubility may be compromised
Solution Approach 1:
The patent introduces different functional groups at specific positions of the molecular structure - the iodine atom provides sensitizing effect while the cyclic group and other substituents provide solubility, achieving both improved reliability and ease of manufacture through localized functional differentiation
Solution Approach 2:
The patent creates a composite molecular structure combining iodine-containing groups for sensitizing effect with cyclic groups and other functional groups for solubility, achieving synergistic improvement in both sensitizing effect and solubility
Data Source
AI summary
A compound represented by the following formula (1):wherein RG is a group containing at least one cyclic structure,I is an iodine atom,R1 is a monovalent functional group having 0 to 30 carbon atoms, containing no polymerizable unsaturated bond, and being optionally the same or different;n is an integer of 1 to 5, andm is an integer of 1 to 5.