Iodo-Containing Polymer Resist Composition for Acid Generation and CDU
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Solution Overview
Problem
Conventional radiation-sensitive compositions exhibit insufficient efficiency in acid generation upon irradiation with radioactive rays, leading to suboptimal sensitivity and Critical Dimension Uniformity (CDU) performance in microfabrication processes.
Innovation Solution
Incorporation of a polymer with an acid-labile side chain and an iodo group-containing side chain having multiple iodo groups and radiation-sensitive onium cation structures, along with optional components like an acid generating agent and acid diffusion control agent, to enhance the radiation-sensitive composition's sensitivity and CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional radiation-sensitive compositions are used, then the composition can be applied to microfabrication processes, but the acid generation efficiency upon irradiation with radioactive rays is insufficient, leading to suboptimal sensitivity and CDU performance
Solution Approach 1:
The patent employs a composite polymer structure containing both acid-labile groups and iodo group-containing side chains with radiation-sensitive onium cation structures. This composite material approach allows the polymer to simultaneously provide acid generation functionality through the onium cations and acid-labile functionality through the separate acid-labile groups, resolving the contradiction between insufficient acid generation efficiency and the need for high sensitivity and CDU performance in microfabrication processes
2Reliability
If the polymer includes both acid-labile side chain and iodo group-containing side chain with onium cation structures, then sensitivity and CDU are improved, but the molecular structure complexity increases
Solution Approach 1:
The patent divides the polymer's functional requirements into separate segments: the main chain provides the polymer backbone, while side chains contain either acid-labile groups or iodo groups with onium cation structures. This segmentation allows each functional group to perform its specific role independently, achieving high sensitivity and CDU performance while managing molecular structure complexity through modular functional design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The enhanced polymer composition improves sensitivity and CDU, enabling superior microfabrication capabilities suitable for semiconductor device processing.
Implementation Method 1
a radiation-sensitive composition for use in microfabrication by lithography generates an acid at light-exposed regions upon an irradiation with a radioactive ray, e.g., an electromagnetic wave such as a far ultraviolet ray such as an ArF excimer laser beam (wavelength of 193 nm), a KrF excimer laser beam (wavelength of 248 nm), etc. or an extreme ultraviolet ray (EUV) (wavelength of 13.5 nm)
Implementation Method 2
an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s)
Implementation Method 3
A chemical reaction in which the acid serves as an origin causes a difference in rates of dissolution in a developer solution of the light-exposed regions and light-unexposed regions
Data Source
AI summary
A radiation-sensitive composition includes a polymer including: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A method of forming a resist pattern includes: applying the radiation-sensitive composition directly or indirectly on a substrate to form a resist film; exposing the resist film; and developing the resist film exposed. A polymer includes: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A monomer is a vinyl compound including two or more iodo groups and one or more radiation-sensitive onium cation structure(s).