Movable Ion Beam Angle Detection Apparatus
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Solution Overview
Problem
Existing ion implantation systems can only measure the beam angle at discrete locations, leading to implantation angle errors due to non-parallel ion paths, and require large, costly masks to achieve uniformity measurements across the entire width of the ion beam.
Innovation Solution
A moveable ion beam angle detection apparatus with a profiler assembly and a linear drive system allows for continuous measurement of the ion beam angle along its entire width, using a moveable angle mask that can be positioned dynamically to adjust for time-varying focal properties and compensate for beam variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a mask with multiple apertures is used to measure beam angle at defined locations, then measurement capability is provided, but the mask must be as wide as the ribbon beam resulting in a large and costly assembly
Solution Approach 1:
The patent applies the dynamics principle by making the mask movable along the ribbon beam width rather than stationary. The mask can be positioned at different locations to measure beam angle across the entire beam width sequentially, eliminating the need for a large fixed mask that spans the entire beam width. This dynamic positioning allows comprehensive measurement coverage with a compact mask structure.
2Measurement precision
If a mask with multiple apertures is used to measure beam angle, then beam angle can be measured at defined locations, but it can only measure at discrete aperture locations not continuously across the beam
Solution Approach 1:
The movable mask can be positioned at multiple discrete locations along the ribbon beam width, and by systematically moving through these locations, continuous measurement coverage is achieved. The dynamic positioning capability allows the measurement system to sweep across the entire beam width, providing comprehensive angular distribution data that effectively represents continuous measurement.
3Area of stationary object
If the beam is scanned back and forth to create a broad beam, then coverage is improved, but the paths of ions are not all parallel resulting in implantation angle errors
Solution Approach 1:
The patent employs feedback by using the movable mask and profiler to measure the actual beam angle distribution across the ribbon beam width. These measurements provide feedback information about angular deviations caused by the scanning process. This feedback can then be used to adjust scanning parameters or beam focusing to compensate for angle errors and improve implantation uniformity across the workpiece.
Data Source
AI summary
An ion beam angle detection apparatus, comprising a linear drive assembly fixedly attached to a moveable profiler assembly, wherein the profiler assembly comprises, a profiler having a profiler aperture formed within a profiler top plate and a profiler sensor assembly, a moveable angle mask assembly comprising a moveable angle mask with a mask aperture, wherein the angle mask assembly is non-fixedly attached to the profiler assembly, the mask aperture is movable relative to the profiler aperture by energizing an mask linear drive fixedly attached to the profiler assembly and the profiler aperture is movable through a length greater than the elongated length of the ion beam.