Ion Beam Angle Measurement Using Relative Movement
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Solution Overview
Problem
Current ion implantation processes in semiconductor manufacturing require extensive time to measure two-dimensional ion beam angle information, which hampers the throughput of the manufacturing process.
Innovation Solution
An ion implantation apparatus equipped with a beamline device, first and second angle measuring instruments, and a control device that calculates angle information in a third direction by relative movement of these instruments with respect to the ion beam, allowing for quicker acquisition of two-dimensional ion beam angle data.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If two-dimensional ion beam angle information is measured using conventional methods, then measurement precision is ensured, but measurement time becomes excessively long
Solution Approach 1:
The patent introduces a third direction (vertical to both beam traveling direction and relative movement direction) to calculate the complete two-dimensional angular distribution. By measuring in two directions (first and second directions) and calculating the third direction, the system obtains full 2D angular information without requiring exhaustive measurements in all possible directions, thus reducing measurement time while maintaining precision.
Solution Approach 2:
The patent employs a relative movement mechanism that dynamically changes the positions of the first and second angle measuring instruments relative to the ion beam during measurement. This dynamic positioning allows the instruments to scan through different angular positions efficiently, capturing comprehensive angular distribution data in a single coordinated movement rather than requiring static measurements at multiple fixed positions.
2Measurement precision
If angle measuring instruments are positioned to measure ion beam angle information accurately, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The first and second angle measuring instruments are designed to measure angle information in multiple directions (first direction, second direction, and calculated third direction). This multi-functional capability allows a single instrument configuration to obtain complete two-dimensional angular distribution data, reducing the need for multiple specialized instruments and thereby lowering overall system complexity while maintaining measurement precision.
Data Source
AI summary
An ion implantation apparatus includes a first angle measuring instrument configured to measure angle information on an ion beam in a first direction, a second angle measuring instrument configured to measure angle information on the ion beam in a second direction, a relative movement mechanism configured to change relative positions of the first angle measuring instrument and the second angle measuring instrument with respect to the ion beam in a predetermined relative movement direction, and a control device configured to calculate angle information on the ion beam in a third direction perpendicular to both a beam traveling direction and the relative movement direction based on the angle information on the ion beam in the first direction measured by the first angle measuring instrument and the angle information on the ion beam in the second direction measured by the second angle measuring instrument.