Ion Beam Electrode Configuration for Independent Control
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Solution Overview
Problem
Current ion implantation technologies face challenges in independently controlling the deflection, deceleration, and focus of an ion beam, limiting the precision and quality of ion implantation in semiconductor manufacturing.
Innovation Solution
An electrode configuration with stationary upper and lower electrodes, where the potential difference between them is varied along the central ray trajectory to control the ion beam's energy, allowing for independent deflection, deceleration, and focus, using symmetric, graded, flared, or parallel configurations with rod-shaped electrodes and side elements for enhanced focusing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional electrostatic deceleration lenses are used to control ion beam energy, then deceleration can be achieved, but independent control of deflection, deceleration, and focus is limited
Solution Approach 1:
The deceleration lens is segmented into multiple electrode pairs along the ion beam trajectory, with each pair independently controllable for deflection and deceleration. This segmentation allows independent control of different beam parameters without requiring separate complete lens systems.
Solution Approach 2:
Each electrode pair serves multiple functions simultaneously - providing both deceleration through potential difference and deflection through asymmetric voltage application. This multi-functionality reduces the need for separate dedicated components for each control parameter.
2Adaptability or versatility
If multiple power supplies are used to control different beam parameters, then independent control is improved, but device complexity and cost increase
Solution Approach 1:
Multiple power supplies are merged into a single power supply system that sequentially or simultaneously drives different electrode pairs. The single power supply alternates or independently controls voltages across multiple electrode pairs, achieving the same functional result as multiple separate power supplies with reduced complexity.
Solution Approach 2:
The system uses dynamic voltage switching and time-dependent control of the single power supply to achieve independent control of multiple beam parameters. By dynamically adjusting which electrode pairs are active and at what voltages, the system provides versatile control without the static complexity of multiple permanent power supplies.
3Manufacturing precision
If high deceleration ratios are achieved, then beam energy control is improved, but over-focusing occurs
Solution Approach 1:
Different regions of the deceleration lens have different electrode configurations and potential gradients optimized for their local function. Entrance regions provide deceleration while exit regions provide focusing control, with each local region's electrode geometry and voltage tailored to its specific role in the overall beam control.
Solution Approach 2:
The deceleration process is segmented into multiple stages with different electrode pairs handling different aspects of beam control. By distributing the total deceleration across multiple segmented stages, each stage can be optimized to avoid excessive focusing while contributing to the overall energy reduction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise control over the ion beam's shape and energy, improving the quality of ion implantation by maintaining high deceleration ratios while avoiding over-focusing, and reducing the need for multiple power supplies, thus enhancing the efficiency and accuracy of ion implantation processes.
Implementation Method 1
A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory
Data Source
AI summary
Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.


