Opposing Ion Beam Generator Grid Occlusion
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Substrate processing techniques using ion guns arranged opposite each other face issues with mutual contamination and damage due to ion beams passing through openings in substrates, affecting the internal components of the ion beam generators.
Innovation Solution
The substrate processing apparatus employs a configuration where each ion beam generator has a grid with an occluded region corresponding to the substrate's opening, preventing ion beams from passing through and reducing contamination or damage to the generators.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If ion beam generators are arranged opposite each other to process both surfaces of a substrate, then processing efficiency is improved, but mutual contamination and damage of the ion beam generators occurs due to ion beams passing through substrate openings
Solution Approach 1:
A grid structure is introduced as an intermediary component between the ion beam generator and the substrate. The grid includes occluded regions that block ion beams from passing through substrate openings to reach the opposing ion beam generator, while still allowing the ion beam processing function to operate on the substrate surfaces
Solution Approach 2:
The grid structure implements local quality by having occluded regions specifically positioned at areas corresponding to substrate openings, while other regions of the grid remain open to allow ion beam passage. This localized blocking approach prevents contamination only where needed (through openings) while maintaining processing capability in other areas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses the entry of ion beams into the opposing ion beam generators, preventing mutual contamination and damage, thereby ensuring the integrity and functionality of the processing apparatus.
Implementation Method 1
a first ion beam generator including a first ion extraction mechanism for extracting ions in a plasma
Implementation Method 2
each of the first ion beam generator and the second ion beam generator is arranged so as to apply an ion beam to a region between the first ion beam generator and the second ion beam generator
Data Source
AI summary
The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.