Ion Beam Grid Hole Pattern Control for Uniformity
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Solution Overview
Problem
Existing ion beam sources face challenges in achieving uniform ion beam density profiles due to non-uniform ion generation in electric discharge plasmas, leading to discontinuities in grid hole density and ion beam current density at zone boundaries in conventional grid designs.
Innovation Solution
A design process that mathematically varies hole locations and sizes in ion beam grids by 'stretching' or 'shrinking' hole-to-hole distances to achieve continuous grid transparency, eliminating discrete zones and manually adjusted hole manipulations, using differential equations to generate new grid patterns that ensure smooth transitions and improved uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If discrete sections of grid patterns with different hole-to-hole distances are used to achieve uniform ion beam current density, then ion beam uniformity is improved, but discontinuities and disturbances occur at the boundaries between discrete sections
Solution Approach 1:
The grid pattern is divided into multiple discrete radial sections, each with different hole-to-hole distances optimized for specific radial zones. This segmentation allows the grid transparency to be tailored for different regions of the ion beam, improving overall uniformity while maintaining manageable design complexity
Solution Approach 2:
Each discrete section of the grid pattern has locally optimized hole-to-hole distances and hole diameters specific to its radial zone. This local quality approach ensures that each section contributes optimally to uniformity in its specific region, while the collective effect addresses the overall non-uniform plasma ion density distribution
2Manufacturing precision
If manual hole-by-hole adjustment is performed to smooth transitions at zone boundaries, then boundary discontinuities are reduced, but design complexity and time consumption increase significantly
Solution Approach 1:
The grid pattern is designed with pre-calculated hole locations and sizes for each discrete section that anticipate and prepare for boundary transitions. By establishing the hole pattern parameters in advance for each zone before assembly, the design process avoids the need for complex post-assembly adjustments while maintaining boundary smoothness
Solution Approach 2:
The hole-to-hole distance and hole diameter parameters are systematically varied across different radial sections according to calculated optimization criteria. This parameter change approach allows smooth transitions at boundaries through controlled variation of geometric parameters rather than manual hole-by-hole adjustment, reducing design complexity while maintaining precision
Data Source
AI summary
A design process for varying hole locations or sizes or both in an ion beam grid includes identifying a control grid to be modified; obtaining a change factor for the grid pattern; and using the change factor to generate a new grid pattern. The change factor is one or both of a hole location change factor or a hole diameter change factor. Also included is an ion beam grid having the characteristic of hole locations or sizes or both defined by a change factor modification of control grid hole locations or sizes or both.