Ion Beam Measuring Device Using Segmented Mask Slits
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Solution Overview
Problem
Existing ion beam measurement methods face challenges in achieving high precision, especially in high-energy ion implantation, due to low beam current and complexity in measuring beam angles perpendicular to the traveling direction.
Innovation Solution
An ion beam measuring device with a mask that shapes the ion beam into x and y beam parts, allowing detection of their positions to calculate beam angles, enabling simultaneous measurement of x and y-direction beam angles using a single mask with elongated slits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If small circular holes are used to restrict the beam passage, then the beam angle measurement is enabled, but the beam current becomes extremely small making high-precision measurement difficult
Solution Approach 1:
The mask is divided into multiple regions with different slit patterns: a first region with slits elongated in the x-direction for measuring x-direction beam angle, and a second region with slits elongated in the y-direction for measuring y-direction beam angle. This segmentation allows each region to optimize for its specific measurement direction while maintaining sufficient beam current.
Solution Approach 2:
The invention transitions from using small circular holes (zero-dimensional point restriction) to using elongated slits (one-dimensional line restriction) in two different orientations. This dimensional change allows the beam to pass through with sufficient current while still enabling precise angle measurement in both x and y directions.
2Measurement precision
If a movable inclined edge is used to measure beam angles, then angle measurement is enabled, but the device complexity increases and simultaneous measurement of two directions becomes complicated
Solution Approach 1:
The invention merges the functionality of measuring beam angles in both x and y directions into a single stationary mask structure. Instead of using separate movable components for each direction, the mask simultaneously provides measurement capabilities for both directions through its slit patterns, greatly simplifying the overall device complexity.
Solution Approach 2:
Instead of using a movable component that physically moves to measure angles, the invention inverts the approach by using a stationary mask with fixed slit patterns. The beam passes through these fixed slits, and the angle is determined by detecting the beam position relative to the known slit orientations, eliminating the need for mechanical movement.
3Use of energy by moving object
If the beam current is small in high energy region, then high energy ion implantation is achieved, but high-precision beam angle measurement becomes difficult
Solution Approach 1:
The mask is segmented into regions with slits of different orientations (x-elongated and y-elongated), allowing the system to measure beam angles in both directions simultaneously. This segmentation enables precise angle measurement even when the total beam current is small, as each slit type can be optimized for its specific measurement direction.
Data Source
AI summary
An ion beam measuring device includes: a mask that is used for shaping an original ion beam into a measuring ion beam including a y beam part elongated in a y direction that is perpendicular to a traveling direction of the ion beam and an x beam part elongated in an x direction that is perpendicular to the traveling direction and the y direction; a detection unit that is configured to detect an x-direction position of the y beam part and a y-direction position of the x beam part; and a beam angle calculating unit that is configured to calculate an x-direction beam angle using the x-direction position and a y-direction beam angle using the y-direction position.