Ion Beam Image Accuracy via Relative Position Feedback

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Solution Overview

Problem

Existing focused ion beam apparatuses face challenges in forming accurate observation images when the relative position of the ion beam column and the sample changes due to disturbances like vibration, leading to incorrect luminance settings for pixels.

Innovation Solution

Incorporating a relative position detection unit to accurately specify the irradiation position of the charged particle beam and setting luminance based on the detected position and secondary particle amounts, ensuring accurate image formation even with position changes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If the relative position of the ion beam column and sample is assumed to be constant, then the image forming process is simple, but the observation image accuracy deteriorates when position changes occur due to vibration

Engineering Contradiction:
Improveimage forming process complexityVSAvoidobservation image accuracy
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent implements a feedback mechanism by detecting the actual relative position between the ion beam column and sample using a position detection unit, then using this detected position information to correct the luminance settings in the image forming process. This closed-loop feedback ensures that even when vibration causes position changes, the system automatically adjusts to maintain accurate observation images.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent applies preliminary action by detecting the relative position before the image forming process and using this pre-detected position information to specify the irradiation position and set luminance values. By preparing the position data in advance, the system can compensate for position changes without adding complexity to the core image forming operation.

Inventive Principle:
Principle #10Preliminary action

2Device complexity

If the irradiation position is specified based on scanning signal without position detection, then the device complexity is low, but the luminance setting accuracy deteriorates when position changes occur

Engineering Contradiction:
Improvedevice structure complexityVSAvoidluminance setting accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent introduces a position detection unit as an intermediary component that measures the relative position between the ion beam column and sample. This intermediary provides accurate position information that mediates between the scanning signal and the luminance setting process, enabling precise luminance assignment even when the beam and sample move relative to each other during observation.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Manufacturing precision

If position detection and correction mechanisms are added, then the observation image accuracy improves, but the device complexity increases

Engineering Contradiction:
Improveobservation image accuracyVSAvoiddevice structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent uses feedback by implementing a position detection unit that continuously monitors the relative position between the ion beam column and sample, then feeds this information back to the image forming section for real-time correction of luminance settings. This feedback loop improves observation image accuracy while keeping the added complexity minimal and focused only on the necessary detection and correction functions.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for precise specification of the ion beam's actual irradiation position and correct luminance settings, enabling the formation of accurate observation images despite changes in the ion beam column and sample's relative position.

Implementation Method 1

a detector configured to detect the amount of secondary particles emitted from the surface of the sample by the irradiation of the charged particle beam

Methodology Applied
Scientific EffectSecondary particle emission: Electron Impact Desorption

Data Source

PatentUS8890093B2Charged particle beam apparatus and method for forming observation image
Publication Date: 2014.11.18 HITACHI HIGH TECH ANALYSIS CORP
  • US8890093B2 patent drawing
  • US8890093B2 patent drawing
  • US8890093B2 patent drawing

AI summary

A focused ion beam apparatus includes a lens interferometer configured to detect a relative position of an ion beam column and a sample. An image forming section includes an irradiation position specifying section configured to specify an irradiation position of an ion beam based on the detected relative position of the ion beam column and the sample, and a luminance setting section configured to set luminance of a pixel of an observation image based on the specified irradiation position of the ion beam and a detected amount of secondary particles.