Ion Beam Profiling via Perpendicular Slit Apertures
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Solution Overview
Problem
Conventional ion beam profiling systems are overly complex, require large physical footprints, and need costly manipulators with multiple degrees of motion, making them inefficient and costly.
Innovation Solution
An ion beam profiling system with a beam profiling element and an ion-sensitive element, where the beam profiling element includes two parallel slit apertures oriented perpendicularly, allowing for a single degree of motion and a single measurement device to reconstruct a two-dimensional ion beam profile.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional ion beam profiling methods are used, then measurement capability is achieved, but device complexity increases and physical footprint enlarges
Solution Approach 1:
The beam profiling element is segmented into multiple slit apertures (first slit aperture, second slit aperture, third slit aperture) arranged in specific orientations. Each slit aperture measures a specific portion of the ion beam profile, and the combined measurements reconstruct the complete two-dimensional profile. This segmentation allows complex 2D profiling to be achieved through simpler individual measurements.
Solution Approach 2:
The patent uses slits with longitudinal lengths extending in directions parallel to the major surfaces of the beam profiling element. The first slit aperture has its longitudinal length extending in a first direction, the second slit aperture in a second direction perpendicular to the first direction, and the third slit aperture in a third direction perpendicular to both the first and second directions. This three-dimensional arrangement of slits enables two-dimensional profile reconstruction from one-dimensional measurements.
2Measurement precision
If conventional ion beam profiling systems are used, then profiling accuracy is maintained, but physical footprint and cost increase
Solution Approach 1:
The beam profiling element serves multiple functions simultaneously: it defines the measurement geometry through its slit apertures, acts as a mask to control beam access to the ion sensitive element, and provides the structural framework for the profiling system. The ion sensitive element also serves dual purposes as both the detection surface and part of the measurement geometry definition.
Solution Approach 2:
The patent combines the beam profiling element and ion sensitive element into a closely integrated arrangement where the slits in the beam profiling element directly control which portions of the ion beam reach the ion sensitive element. This merging eliminates the need for separate manipulation systems and reduces the overall physical footprint while maintaining profiling accuracy.
3Measurement precision
If multiple degrees of motion manipulators are used, then beam profiling capability is achieved, but system cost and complexity increase
Solution Approach 1:
The beam profiling element and ion sensitive element are arranged so that relative translation between them automatically performs the profiling measurement. The system uses the relative motion itself as the measurement mechanism, eliminating the need for complex manipulators with multiple degrees of freedom. The geometry of the slits and their arrangement provide the measurement capability inherent in the structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution simplifies ion beam profiling, reduces costs, and enables more versatile and reliable operation in smaller vacuum chambers, providing faster profiling and longer system lifespans with fewer potential failure points.
Implementation Method 1
an ion source configured to emit an ion beam at the beam profiling element and the ion sensitive element
Implementation Method 2
an ion sensitive element electrically isolated from the beam profiling element
Data Source
AI summary
An ion beam profiling system include a beam profiling element, an ion sensitive element electrically isolated from the beam profiling element, an ion source configured to emit an ion beam at the beam profiling element and the ion sensitive element, and a current measuring device coupled to the ion sensitive element. The beam profiling element includes a plate of material having two parallel major surfaces, a first slit aperture extending through the plate of material and having a first longitudinal length extending in a direction parallel to the two parallel major surfaces, and a second slit aperture extending through the plate of material and having a second longitudinal length extending in a direction parallel to the two parallel major surfaces, wherein the first longitudinal length of the first slit aperture is perpendicular to the second longitudinal length of the second slit aperture.