Ion Beam Sample Preparation Apparatus with Vacuum Transfer
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Solution Overview
Problem
Current ion beam milling techniques for sample preparation in microscopic analysis are time-consuming and labor-intensive, requiring multiple handling steps that risk sample damage, and lack efficient methods for uniform coating and precise control over coating thickness.
Innovation Solution
An ion beam apparatus with a vacuum chamber system that includes a rotating sample retention stage and a coating donor translation stage, allowing for precise positioning and tilting of ion beams to mill and coat samples efficiently, while minimizing sample handling and optimizing coating uniformity and thickness control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional ion beam milling techniques are used with rotating samples and fixed beams, then uniform milling can be achieved by compensating for shadowing effects, but the processing time is excessive and the method is labor-intensive
Solution Approach 1:
The patent inverts the traditional approach by keeping the sample stationary and moving the ion beam instead. The ion beam is deflected using magnetic or electric fields to scan across the sample surface, eliminating the need for mechanical rotation of the sample while achieving uniform milling through controlled beam scanning patterns.
Solution Approach 2:
The patent replaces the mechanical rotation system with a magnetic or electric field-based beam deflection system. Instead of mechanically rotating the sample to achieve uniform exposure, the ion beam is electronically steered using electromagnetic fields, significantly reducing mechanical complexity and processing time.
2Ease of operation
If multiple handling steps are used for sample preparation and mounting, then sample positioning can be achieved, but the risk of sample damage increases and processing time is extended
Solution Approach 1:
The patent combines multiple functions (sample mounting, positioning, and preparation) into a single integrated vacuum chamber system. The sample is mounted on a stage within the vacuum chamber that allows for precise positioning and adjustment without requiring removal from the chamber, eliminating multiple handling steps and reducing contamination risk.
Solution Approach 2:
The sample stage is designed with multi-functionality, capable of performing mounting, positioning, tilting, and preparation operations all within the vacuum environment. This universal stage design eliminates the need for separate handling equipment and maintains sample integrity throughout the preparation process.
3Quantity of substance
If conventional coating methods are used, then coating can be applied to samples, but uniformity of coating and control over coating thickness are insufficient
Solution Approach 1:
The patent replaces conventional mechanical coating methods with ion beam sputtering deposition. The ion beam is used to sputter coating material from a target onto the sample surface, providing atomic-level control over deposition thickness and superior uniformity through precise control of beam parameters and deposition time.
Solution Approach 2:
The patent utilizes precise control of ion beam parameters (energy, current, scanning pattern) and deposition conditions (temperature, pressure, angle) to optimize coating uniformity and thickness control. By adjusting these parameters, the system achieves precise control over the coating process that conventional methods cannot match.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces processing time, minimizes sample handling risks, and enhances the quality and repeatability of sample preparation and coating, leading to improved microscopy observations by ensuring high-quality, artifact-free samples with controlled coating properties.
Implementation Method 1
The impact of ions on the sample will sputter material away from the area of ion impact
Implementation Method 2
the interaction of the first ion beam with the coating material creating a sputtered coating material in the vacuum chamber
Data Source
AI summary
Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.