Ion Beam Generator Shield for Plug Sidewall Protection
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Solution Overview
Problem
Conventional ion beam generators face issues with adhering films forming on movable members, such as plugs, due to sputtered electrode material, which hampers movement and affects plasma density control, leading to non-uniform etching and tool wear.
Innovation Solution
The ion beam generator incorporates a movable plug with a shield that extends from the wall toward the extraction unit, reducing sputter particle adhesion on the sidewall by minimizing conductance between the shield and sidewall, and using expandable and contractible members for sealing, allowing smooth movement and maintaining plasma uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a movable plug is used to control plasma density profile, then plasma uniformity is improved, but adhering film formation on the plug sidewall increases
Solution Approach 1:
The patent extracts the harmful function (sputter particle adhesion) from the system by introducing a shield that blocks sputter particles from reaching the plug sidewall. The shield is positioned between the grid assembly and the plug, effectively removing the adhesion problem while preserving the plug's plasma control function.
Solution Approach 2:
The shield acts as an intermediary element between the grid assembly and the movable plug. It intercepts sputter particles generated by the grid assembly before they can deposit on the plug sidewall, thus protecting the plug while allowing the plug to continue its plasma density control function.
2Reliability
If a seal member is provided between the plug and chamber wall, then plasma leakage is prevented, but plug movement is hindered due to adhering films
Solution Approach 1:
The patent removes the source of the problem (sputter particle adhesion on the seal member) by positioning the shield to also cover the seal member. This prevents adhering films from forming on the seal member, thereby maintaining smooth plug movement while preserving plasma leakage prevention.
Solution Approach 2:
The shield serves as a protective intermediary for the seal member, blocking sputter particles from reaching the seal member surface. This ensures the seal member remains free of adhering films, maintaining both sealing effectiveness and movement smoothness.
3Manufacturing precision
If the plug moves to adjust plasma density, then etching uniformity is improved, but tool wear increases due to plug sticking
Solution Approach 1:
The shield acts as a protective barrier that prevents sputter particles from depositing on the plug sidewall and seal member. By blocking this harmful deposition, the shield eliminates the sticking problem that would otherwise occur during plug movement, thereby extending tool life while maintaining etching uniformity.
Solution Approach 2:
The shield provides preemptive protection by blocking sputter particles before they can accumulate on the plug and seal member. This prevents the gradual buildup of adhering films that would lead to sticking and tool wear, effectively cushioning against future problems.
4Productivity
If grid assembly is used for ion extraction, then ion beam generation is achieved, but sputter particles are generated that deposit on plug sidewall
Solution Approach 1:
The shield serves as an intermediary that intercepts sputter particles generated by the grid assembly during ion extraction. By positioning the shield between the grid assembly and the plug sidewall, it blocks the harmful particles while allowing the grid assembly to continue its ion extraction function.
Solution Approach 2:
The patent extracts the harmful sputter particles from the system by using the shield to block them before they can reach the plug sidewall. This removes the deposition problem while preserving the beneficial ion beam generation function of the grid assembly.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces adhering film formation on the plug's sidewall, enabling smooth operation and improved plasma density control, ensuring uniform ion beams and extending tool life by preventing plug sticking and maintaining precise etching profiles.
Implementation Method 1
a unit for generating plasma in the chamber
Implementation Method 2
an extraction unit provided opposed to a predetermined wall of the chamber, and configured to extract ions from the plasma
Implementation Method 3
reducing sputter particle adhesion on the sidewall by minimizing conductance between the shield and sidewall
Data Source
AI summary
The invention provides: an ion beam generator and an ion beam plasma processing apparatus including a movable member (for example, a plug) which is capable of reducing formation of an adhering film on a sidewall of the member even when an electrode included in a grid assembly is sputtered. The ion beam generator of an aspect of the invention includes: a grid assembly provided opposed to an upper wall; a plug movable in a first direction from the upper wall toward the grid assembly and in a second direction from the grid assembly toward the upper wall; and a shield configured to shield a sidewall of the plug.