Ion Beam Sample Prep Shield Retention Stage
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current ion beam sample preparation methods are inefficient in reducing handling and processing time, require multiple steps for sample alignment and mounting, and can damage delicate samples, while also increasing the risk of artifacts during microscopic analysis.
Innovation Solution
The use of a shield retention stage with datum features and a rotating shield retention stage that securely adheres the sample to the shield, allowing for precise alignment and repeated processing without the need for extensive fixturing, reducing handling and processing time, and enabling efficient alignment and reprocessing of samples for microscopy and spectroscopy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If traditional ion beam sample preparation methods are used with separate mounting and processing steps, then sample preparation can be completed, but handling time increases and risk of sample damage increases
Solution Approach 1:
The patent combines the sample mounting function and the ion beam processing function into a single integrated stage assembly. The sample is mounted on a mounting stage that can be directly positioned in the ion beam path, eliminating the need to transfer samples between separate mounting and processing equipment. This integration reduces handling steps and minimizes the risk of sample damage while decreasing overall processing time.
Solution Approach 2:
The stage assembly serves multiple functions: it acts as both the mounting platform for the sample and the positioning mechanism for ion beam processing. The stage can be adjusted to precise orientations and positions, enabling both secure sample mounting and accurate alignment with the ion beam without requiring separate specialized equipment for each function.
2Measurement precision
If multiple separate steps are used for sample alignment and mounting, then precise positioning can be achieved, but device complexity increases
Solution Approach 1:
The patent integrates alignment features directly into the mounting stage structure. Datum features are incorporated into the stage itself, allowing precise positioning to be achieved through the stage's inherent mechanical design rather than requiring separate alignment procedures or additional alignment equipment.
Solution Approach 2:
The mounting stage is pre-configured with datum features and alignment mechanisms before sample mounting. This preliminary preparation ensures that when the sample is mounted, precise alignment can be achieved directly through the stage's built-in features without requiring complex subsequent alignment steps.
3Productivity
If samples are handled and transferred between multiple equipment pieces, then processing can be completed, but the number of handling steps increases sample damage risk
Solution Approach 1:
By combining mounting and processing capabilities into a single integrated stage system, the patent eliminates the need to transfer samples between separate mounting equipment and ion beam processing equipment. The sample remains on the same stage throughout the entire process, significantly reducing handling steps and minimizing opportunities for sample damage while maintaining processing efficiency.
4Stability of the object's composition
If extensive fixturing is used to secure samples during processing, then sample positioning stability is improved, but device complexity and processing time increase
Solution Approach 1:
The mounting stage is pre-configured with integrated fixation features and alignment mechanisms that are built into the stage structure itself. This preliminary design allows samples to be securely positioned using the stage's inherent features rather than requiring extensive external fixturing, thereby maintaining positioning stability while reducing overall device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly reduces the time and risk of sample damage during processing and analysis, ensures high-quality cross-sectional preparation, and allows for efficient reuse of samples by maintaining precise alignment and orientation, thereby enhancing the quality and efficiency of microscopic and spectroscopic observations.
Implementation Method 1
The impact of ions on the sample sputters material away from the area of ion impact
Implementation Method 2
the sample surface may be polished by the ion beam to a substantially smooth condition further enhancing observational properties of the sample
Data Source
Figure 1~2
Figure 3A~4
Figure 5A~6
AI summary
Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.