Ion Beam Angular Distribution Measurement Using Movable Slits
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Solution Overview
Problem
Current ion implantation processes in semiconductor manufacturing require extensive time to evaluate the angular distribution of ion beams, which hampers throughput and efficiency.
Innovation Solution
An ion implantation apparatus and measurement device that utilize a beamline with movable slits and a beam current measurement unit to quickly assess the angular distribution of ion beams by measuring beam current at multiple positions perpendicular to the beam travel direction, allowing for swift evaluation of the ion beam's angular distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single slit is used to measure angular distribution, then measurement precision is improved, but productivity deteriorates due to time-consuming sequential measurements
Solution Approach 1:
The patent divides the measurement system into multiple slits (first slit, second slit, third slit, etc.) arranged in the beam width direction. Each slit independently measures angular distribution at different positions simultaneously, eliminating the need for sequential measurements and thereby improving productivity while maintaining measurement precision through the segmented parallel measurement approach
Solution Approach 2:
The patent transitions from single-point measurement to multi-point simultaneous measurement by arranging slits in the beam width direction (spatial dimension). This dimensional expansion allows angular distribution to be measured at multiple positions concurrently, resolving the contradiction between measurement precision and productivity
2Measurement precision
If multiple measurement positions are measured sequentially with one slit, then measurement precision is improved, but loss of time increases
Solution Approach 1:
The patent merges multiple measurement functions into a single measurement system by combining multiple slits and multiple beam current measurement units. This integrated system simultaneously performs angular distribution measurements at multiple positions, eliminating the time loss associated with sequential measurements while maintaining comprehensive measurement precision
Solution Approach 2:
The patent enables continuous simultaneous measurement at multiple positions through the array of slits and beam current measurement units. All measurements occur concurrently in a single continuous operation rather than through discrete sequential steps, thereby eliminating time loss while preserving measurement precision through continuous multi-point data acquisition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time required to evaluate the angular distribution of ion beams, enhancing the efficiency and speed of semiconductor manufacturing processes.
Implementation Method 1
the current value of the beam that has passed through a slit is measured at a plurality of electrodes lining up in the width direction of the slit
Data Source
AI summary
A measurement device includes a plurality of slits, a beam current measurement unit provided at a position away from the slits in a beam traveling direction, and a measurement control unit. The beam current measurement unit is configured to be capable of measuring a beam current at a plurality of measurement positions to be different positions in a first direction perpendicular to the beam traveling direction. The slits are disposed to be spaced apart in the first direction such that the first direction coincides with a slit width direction and are configured to be movable in the first direction. The measurement control unit acquires a plurality of beam current values measured at the plurality of measurement positions to be the different positions in the first direction with the beam current measurement unit while moving the slits in the first direction.