Ion Beam Deposition Target Offset for Longer Target Life
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Solution Overview
Problem
Ion Beam Deposition (IBD) systems suffer from low target utilization, leading to frequent maintenance, reduced tool availability, and increased costs due to the central containment of 99.7% of the ion beam within a small target area, resulting in inefficient use of targets.
Innovation Solution
Offsetting the target from the nominal position of the ion beam to utilize a greater area of the target, allowing for symmetrical shifting of the sputter plume, thereby extending target life without causing premature failure of indexing hardware or cooling systems, and allowing for controlled adjustments in offset positions and ion beam exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the ion beam is directed at the center of the target, then the deposition rate and uniformity are maintained, but the target utilization is low leading to frequent maintenance
Solution Approach 1:
The patent applies asymmetry by offsetting the target position relative to the ion beam centerline, creating an asymmetric illumination pattern that utilizes the peripheral areas of the target. This asymmetric positioning allows the ion beam to strike off-center regions, thereby expanding the effective utilization area of the target while maintaining deposition performance through controlled asymmetry in the sputter plume distribution.
Solution Approach 2:
The patent introduces a positional offset dimension by shifting the target center away from the ion beam axis, effectively utilizing the radial dimension of the target that would otherwise remain unused. This dimensional shift transforms the utilization pattern from a centralized circular area to an expanded annular or off-center region, increasing the effective target area without compromising deposition uniformity.
2Duration of action of stationary object
If the target position is offset to increase utilization, then target life is extended, but deposition uniformity may be compromised
Solution Approach 1:
The patent employs dynamics by implementing periodic or rotational offset patterns where the target position is dynamically adjusted during operation. The target may be rotated or repositioned between different offset locations, creating a dynamic utilization pattern that distributes wear across multiple areas while maintaining deposition uniformity through time-averaged symmetry in the material deposition process.
Solution Approach 2:
The patent applies periodic action by alternating the target offset position between symmetric locations or by rotating the target through specific angular positions during operation. This periodic repositioning ensures that different peripheral areas are utilized in a systematic sequence, extending target life while the periodic symmetry maintains overall deposition uniformity across the substrate.
3Duration of action of stationary object
If multiple targets are used to increase utilization, then target life is extended, but system complexity increases
Solution Approach 1:
The patent applies universality by enabling a single target to perform multiple functions through offset positioning - it can be positioned at different offset locations to serve as multiple effective targets, or rotated to present different areas to the ion beam. This multi-functional capability of a single target eliminates the need for multiple physical targets while achieving the same effect of extended target life and increased utilization.
Solution Approach 2:
The patent applies segmentation by dividing the target utilization into multiple offset positions or angular sectors, where each position or sector is utilized sequentially or simultaneously. This segmentation of the target area into multiple functional zones allows a single target to replace multiple targets, reducing system complexity while maintaining extended target life through distributed utilization patterns.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances target utilization, reducing maintenance frequency and costs, while maintaining deposition rate and uniformity, and increasing tool availability without complex hardware modifications.
Implementation Method 1
a first ion beam is directed at a first location of a first target... exposing a first substrate to sputtered material from said first location of said first target
Implementation Method 2
moving each target by rotating the central axis
Data Source
AI summary
The present disclosure provides a method for increased target utilization within a sputtering system. A plurality of targets are provided wherein each target is operatively connected to a central axis. An ion beam is generated within the sputtering system. The generated ion beam is directed at a first location of a first target for a first time period. Each target is moved by rotating the central axis. The generated ion beam is directed at a second location of the first target for a second time period.