Ion and Electron Beam Composition Analysis for Semiconductor Minute Regions
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Solution Overview
Problem
Current methods for evaluating semiconductor devices struggle to accurately analyze the composition of minute regions, which can significantly impact device characteristics.
Innovation Solution
A composition analysis system that uses a combination of ion beam and electron beam irradiation to thin samples, detect X-ray intensity, and analyze elemental composition, allowing for precise analysis of minute regions through repeated irradiation and detection cycles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional composition analysis methods are used, then analysis can be performed, but measurement precision is insufficient for minute regions
Solution Approach 1:
The analysis process is segmented into multiple iterative steps: ion beam irradiation to thin the sample, electron beam irradiation for X-ray generation, and detection cycles. This segmentation allows progressive thinning of the sample to achieve sufficient measurement precision for minute regions.
Solution Approach 2:
The ion beam irradiation is performed as a preliminary action before electron beam irradiation to pre-thin the sample. This preliminary thinning reduces the sample thickness to a level suitable for subsequent composition analysis, enabling detection in minute regions.
2Measurement precision
If sample thickness is reduced for better analysis, then measurement precision improves, but the sample structure may be damaged
Solution Approach 1:
The analysis employs periodic alternating irradiation with ion beams and electron beams. The ion beam periodically thins the sample while the electron beam performs composition analysis. This periodic action allows controlled, incremental thinning that maintains sample structure stability while improving measurement precision.
Solution Approach 2:
The system uses feedback from X-ray intensity detection to monitor sample thickness and composition changes. This feedback information guides subsequent irradiation parameters, ensuring the sample is thinned to the optimal degree for analysis without excessive damage.
3Measurement precision
If multiple irradiation cycles are performed to analyze minute regions, then analysis precision improves, but analysis time increases
Solution Approach 1:
The analysis process maintains continuous useful action by alternating between ion beam thinning and electron beam analysis without idle time. Each cycle builds upon the previous one, progressively improving precision while minimizing non-productive time through efficient cycle integration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate determination of elemental composition in semiconductor devices by iteratively reducing sample thickness and correlating X-ray intensity with elemental presence, enhancing analysis precision and accuracy in minute regions.
Implementation Method 1
irradiating a sample with an ion beam; irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam
Implementation Method 2
irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam; detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam
Implementation Method 3
detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam
Data Source
AI summary
A composition analysis method includes iteratively irradiating a sample with an ion beam, irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam, and detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam. The method further includes determining an identity of an element included in the sample based on at least one detection result obtained in the iterative process.