Ion Gun Mass Flow Control for Antireflective Film Deposition

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Solution Overview

Problem

Existing ion gun systems face challenges in efficiently changing film formation conditions between low-refractive-index and high-refractive-index layers during the formation of multi-layer antireflective films, leading to prolonged processing times and potential abnormal stoppages.

Innovation Solution

Implementing a mass flow control and ion gun control system that changes gas flow rates and acceleration settings stepwise within stable ranges, including a power-down phase, to smoothly transition between layer formations without interrupting the ion gun's operation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the film formation conditions (acceleration voltage, acceleration current, gas flow rate) are changed between low-refractive-index and high-refractive-index layers, then the film quality can be optimized for each layer type, but the processing time is prolonged and abnormal stoppages may occur

Engineering Contradiction:
Improvefilm qualityVSAvoidprocessing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The control unit pre-establishes multiple sets of film formation conditions corresponding to different layer types (low-refractive-index and high-refractive-index layers). By having the optimal conditions prepared in advance for each layer type, the system can switch between conditions without performing real-time optimization calculations, thus reducing processing time while maintaining film quality.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system dynamically switches between different pre-established film formation condition sets based on the current layer being deposited. The control unit adjusts acceleration voltage, acceleration current, and gas flow rate parameters according to whether a low-refractive-index or high-refractive-index layer is being formed, enabling optimal film quality for each layer type while minimizing switching time through automated condition selection.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If the film formation conditions are changed between layers, then the multi-layer film can be optimized for different refractive indices, but the ion gun may become unstable and cause abnormal stoppages

Engineering Contradiction:
Improvemulti-layer film optimizationVSAvoidion gun stability
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The system pre-determines and stores multiple sets of film formation conditions that have been optimized for different layer types. By having these conditions prepared in advance and validated for stability, the system avoids real-time parameter adjustments that could cause ion gun instability, thus maintaining reliability while achieving multi-layer optimization.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The control unit monitors the ion gun operation status and film formation process in real-time. When switching between different film formation conditions for different layers, the system uses feedback from sensors to detect any instability and adjusts parameters accordingly, preventing abnormal stoppages while maintaining the ability to optimize each layer type.

Inventive Principle:
Principle #23Feedback

3Productivity

If the film formation conditions are kept constant for all layers, then the processing time is reduced and operation is simplified, but the film quality cannot be optimized for different refractive-index layers

Engineering Contradiction:
Improveproduction efficiencyVSAvoidfilm quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The control unit pre-establishes multiple sets of film formation conditions optimized for different layer types (low-refractive-index and high-refractive-index layers). By having these optimal conditions prepared in advance, the system can quickly switch between them during production, achieving both high productivity through automated switching and high film quality through layer-specific optimization.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system dynamically selects and switches between different pre-optimized film formation condition sets based on the current layer type being deposited. This dynamic condition switching enables the system to maintain high production efficiency while achieving optimal film quality for each specific layer type, resolving the contradiction between constant conditions and layered optimization.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces film formation time while maintaining film quality and preventing ion gun instability, allowing for efficient production of multi-layer antireflective films without abnormal stoppages.

Implementation Method 1

an ion-assisted method is used for forming all layers of films

Methodology Applied
Scientific EffectIon beam: Ion Beam

Implementation Method 2

irradiated with oxygen and/or argon ion

Methodology Applied
Scientific EffectIon beam irradiation: Ion Beam

Implementation Method 3

a water repellent layer is formed by vapor deposition on the outermost layer by heating a water repellent source material containing a fluorine-substituted alkyl group-containing organic silicon compound with an electron gun

Methodology Applied
Scientific EffectElectron beam heating: Electron Beam

Data Source

PatentEP2003225B1Ion gun system, vapor deposition apparatus and process for producing lens
Publication Date: 2016.09.14 HOYA CORPORATION
  • EP2003225B1 patent drawingFigure 1
  • EP2003225B1 patent drawingFigure 2
  • EP2003225B1 patent drawingFigure 3

AI summary

An ion gun system 60 includes an ion gun 14 for irradiating an ion beam; an electric power supply unit 61 for supplying electric power to the ion gun; two mass flow regulators 64, 65 for introducing each of two types of gas in the ion gun; a control unit 12 connected to the electric power supply unit for working as ion gun control means for controlling electric power supplied to the ion gun from the electric power supply unit; and a control unit 12 connected to the mass flow regulators for working as mass flow control means for controlling the flow rate of gas introduced from the mass flow regulators in the ion gun. The control unit 12 as mass flow control means is provided with a function of changing the set value for the flow rate of each of the two types of gas to another set value by changing it stepwise within a range where the ion gun is working stably. Accordingly, shortening of film formation time can be attained.