Ion Implantation Angle Control Using Wafer Off-Angle Data
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Solution Overview
Problem
Existing ion implantation systems lack the capability to accurately adjust the ion implantation angle based on off-angle data of wafers, leading to inefficiencies in the ion implantation process.
Innovation Solution
An ion implantation processing system that acquires off-angle data from a server and controls the ion implantation angle accordingly, enhancing precision and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If ion implantation is performed without acquiring off-angle data from a server, then the processing is simpler and faster, but the implantation accuracy deteriorates
Solution Approach 1:
The patent introduces a server as an intermediary component that stores and provides off-angle data to the ion implantation device. This mediator allows the system to access precise wafer off-angle information without requiring complex measurement equipment within the implantation device itself, thereby improving implantation accuracy while maintaining relatively simple device architecture.
Solution Approach 2:
The system performs preliminary acquisition and storage of off-angle data in a server before the actual ion implantation process. By having this data prepared in advance and readily accessible, the system eliminates the need for complex real-time measurements during implantation, thus improving accuracy without proportionally increasing system complexity.
2Manufacturing precision
If off-angle data is acquired from a server, then implantation precision improves, but processing time increases
Solution Approach 1:
The off-angle data is measured and stored in the server in advance, before the ion implantation process begins. This preliminary preparation eliminates the need for time-consuming measurements during the actual implantation, thus improving precision without significantly increasing total processing time.
Solution Approach 2:
Instead of performing physical measurements during implantation, the system uses pre-acquired off-angle data stored in the server. This data copy approach allows rapid retrieval of precise angle information without the time penalty of repeated physical measurements, balancing precision requirements with processing efficiency.
Data Source
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AI summary
In an ion implantation processing system including an ion implantation device, the ion implantation device acquires, from a server, off-angle data of a wafer that is an ion implantation processing target and controls an ion implantation angle with respect to the wafer based on the off-angle data.