Ion Implanted Glass Substrates Scratch Resistance
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Solution Overview
Problem
Glass substrates are prone to scratches when exposed to mechanical contact, and existing methods like thermal and chemical tempering or ion implantation either compromise mechanical strength or visibility, or require expensive equipment and processes with limited ion depth distribution.
Innovation Solution
A method of ion implanting glass substrates using an Electron Cyclotron Resonance ion source to generate both single and multicharge ions, such as Ar, N, and He, at specific energies and dosages to create a three-dimensional implantation zone, enhancing scratch resistance without the limitations of narrow depth distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If high ion dosage is implanted in a limited area, then scratch resistance is improved, but glass substrate degrades due to increased stress
Solution Approach 1:
The patent changes the charge state parameter of implanted ions from single charge to multicharge (e.g., Ar3+, Ar4+, Ar5+), which fundamentally alters the ion distribution profile in the glass substrate. This parameter change allows achieving high scratch resistance without the harmful concentration effects that occur with single charge ions at high dosages.
2Ease of manufacture
If single charge ions are used for implantation, then equipment cost is reduced, but depth distribution profile becomes narrow
Solution Approach 1:
The patent changes the charge state parameter of implanted ions from single charge to multicharge (e.g., Ar3+, Ar4+, Ar5+), which fundamentally alters the ion distribution profile in the glass substrate. This parameter change allows achieving high scratch resistance without the harmful concentration effects that occur with single charge ions at high dosages.
3Length of stationary object
If high ion energy is used for implantation, then implantation depth is increased, but glass substrate becomes curved due to high stress
Solution Approach 1:
The patent changes the charge state parameter of implanted ions from single charge to multicharge (e.g., Ar3+, Ar4+, Ar5+), which fundamentally alters the ion distribution profile in the glass substrate. This parameter change allows achieving high scratch resistance without the harmful concentration effects that occur with single charge ions at high dosages.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method significantly increases the scratch resistance of glass substrates, allowing for higher ion dosages while maintaining a wider depth distribution, enabling their use in various applications without compromising mechanical strength or visibility.
Implementation Method 1
a method of ion implanting glass substrates using an Electron Cyclotron Resonance ion source to generate both single and multicharge ions
Implementation Method 2
Electron Cyclotron Resonance ion source
Implementation Method 3
the ions of the beam are selected from the ions of Ar, N and He... the ion acceleration voltage is set at a value comprised between 5 and 200 kV... the ion dosage per surface unit is set at a value comprised between 1012 ions/cm2 and 1018 ions/cm2
Data Source
AI summary
The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.