Ion Implanter Beam Profiler Aperture Array
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Solution Overview
Problem
Existing ion implanter technologies face inaccuracies in measuring beam current distribution due to escaped charged particles from Faraday cups, which can affect the measurement of the incident ion beam and lead to incorrect readings.
Innovation Solution
An ion implanter with a beam profiler that includes an aperture array and a cup electrode array, where the apertures and cup electrodes are designed to direct the ion beam portions into specific cavities, and a magnetic field is applied to suppress secondary ions and electrons, ensuring accurate measurement of the beam current distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a plurality of Faraday cups are disposed side by side to measure beam current distribution, then measurement capability is provided, but escaped charged particles cause measurement inaccuracy
Solution Approach 1:
The patent converts the harmful effect of escaped charged particles into a beneficial measurement mechanism. By intentionally allowing secondary ions and electrons to escape from the Faraday cup and directing them onto a detector positioned downstream, the system transforms measurement errors into useful signals that provide comprehensive beam current distribution information including both primary and secondary charged particles.
Solution Approach 2:
The patent introduces a detector as an intermediary element between the Faraday cup array and the final measurement readout. This detector captures the escaped charged particles that would otherwise cause measurement errors, and converts them into measurable signals. The detector acts as a mediator that transforms the problematic escaped particles into useful measurement data, thereby improving overall measurement accuracy and reliability.
2Measurement precision
If multiple apertures with different shapes are used to provide different beam portions, then comprehensive beam measurement is achieved, but device complexity increases
Solution Approach 1:
The patent divides the beam measurement function into multiple segments by using an aperture array with differently shaped apertures (e.g., circular, rectangular, triangular) that each provide different beam portions. Each aperture-cup electrode combination acts as an independent measurement segment, allowing comprehensive characterization of the beam current distribution through multiple geometric perspectives simultaneously.
Solution Approach 2:
The patent creates a universal measurement system where the aperture array and cup electrode array work together to perform multiple measurement functions simultaneously. The same basic structure (aperture + cup electrode + detector) can measure different beam portions by simply changing the aperture shape, providing a multi-functional platform that reduces overall system complexity compared to having separate dedicated measurement devices for each beam characteristic.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively captures and measures the ion beam current distribution with high accuracy, reducing errors caused by secondary particles and allowing for precise control and monitoring of the ion implantation process.
Implementation Method 1
The plurality of magnets apply a magnetic field to the first cavity and the second cavity along an in-plane direction in a plane perpendicular to the traveling direction
Data Source
AI summary
An ion implanter includes a beam scanner that performs a scanning with an ion beam in a scanning direction perpendicular to a traveling direction of the ion beam, and a beam profiler that is disposed downstream of the beam scanner and measures a beam current distribution of the ion beam when the scanning by the beam scanner is performed. The beam profiler includes an aperture array that includes a first aperture and a second aperture, a cup electrode array that is disposed to be fixed with respect to the aperture array, the cup electrode array including a first cup electrode and a second cup electrode, and a plurality of magnets.