Ion Implanter End Effector Vertical Positioning Sensor

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Solution Overview

Problem

Inaccurate vertical position determination of the end effecter in ion implanter systems due to mechanical variations such as slip, belt stretching, and gear wear, leading to potential misalignment and damage during wafer handling.

Innovation Solution

Incorporation of a sensor within the load lock to determine the vertical position of the end effecter, which can trigger based on the movement of the blades, allowing for precise positioning by emitting a beam or using a Hall effect sensor to accurately calculate the vertical position.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If encoder data from the rotary motor is used to determine vertical position, then the system is simple and cost-effective, but measurement precision deteriorates over time due to mechanical variations

Engineering Contradiction:

Improveposition determination systemVSAvoidvertical position accuracy

Core Design Contradiction:

Device complexityVSMeasurement precision

Solution Approach 1:

A laser sensor is introduced as an intermediary measurement device between the end effecter and the control system. The sensor independently measures the vertical position by detecting the end effecter's location, providing accurate real-time data without relying on the mechanical encoder system. This mediator approach resolves the contradiction by decoupling position measurement from the mechanical drive system that suffers from slip and wear.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces the mechanical encoder-based position determination system with an optical sensing system. Instead of relying on mechanical components (rotary motor, encoder, ball screw) that are prone to wear and slip, the system uses a laser sensor to optically detect the vertical position of the end effecter, eliminating the accumulation of mechanical errors over time.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Device complexity

If mechanical components (belt, ball screw, gear) are used for vertical movement, then the device complexity is low, but reliability deteriorates due to slip, stretching, and wear

Engineering Contradiction:

Improvevertical movement mechanismVSAvoidposition accuracy

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The laser sensor provides continuous feedback on the actual vertical position of the end effecter. This feedback loop allows the control system to detect deviations from the commanded position caused by mechanical variations and compensate for them in real-time, thereby maintaining reliability despite the presence of mechanical components prone to wear and slip.

Inventive Principle:

Principle #23Feedback

3Device complexity

If encoder data is used for position determination, then the system remains simple, but manufacturing precision deteriorates due to misalignment risk

Engineering Contradiction:

Improveposition determination systemVSAvoidwafer alignment accuracy

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

The patent replaces the mechanical encoder-based position determination with an optical sensing system that directly measures the vertical position of the end effecter. This substitution eliminates the accumulation of mechanical errors that would otherwise lead to misalignment of wafers during the ion implantation process, thereby maintaining high manufacturing precision without increasing system complexity.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Ensures accurate vertical positioning of the end effecter, reducing the risk of misalignment and damage to wafers by providing a reliable method for determining the end effecter's position, thereby enhancing the precision and safety of the ion implantation process.

Implementation Method 1

a sensor positioned within the load lock to determine a vertical position of the end effecter... emitting a beam or using a Hall effect sensor to accurately calculate the vertical position

Methodology Applied

Scientific EffectLight: Light

Implementation Method 2

emitting a beam or using a Hall effect sensor to accurately calculate the vertical position

Methodology Applied

Scientific EffectHall effect: Hall Effect

Data Source

PatentUS7675048B2Wafer holding robot end effecter vertical position determination in ion implanter system

Publication Date: 2010.03.09 VARIAN SEMICON EQUIP ASSC INC

AI summary

A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.