Ion Implanter Mass Analyzer for Beam Angle Correction
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Solution Overview
Problem
Conventional ion implantation systems face complexity and increased beam path length when attempting to adjust the angle of ion beams, which can lead to non-uniform angular distribution and undesired implant properties.
Innovation Solution
Employing a mass analyzer for both mass analysis and angle correction within the ion implantation system, utilizing a resolving aperture and control system to adjust the magnetic field and aperture position based on angle measurement data, allowing for angle adjustments without additional components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional beam angle adjustment methods are used, then angle correction is achieved, but system complexity increases and beam path length increases
Solution Approach 1:
The mass analyzer is designed to perform dual functions: mass analysis and beam angle adjustment. By configuring the mass analyzer to deflect ion beams at different angles depending on operating conditions, the system achieves angle correction without adding separate adjustment components, thereby reducing system complexity while maintaining precise angle control
Solution Approach 2:
The system adjusts beam angle by changing the magnetic field parameters within the existing mass analyzer. By varying the magnetic field strength and configuration, the mass analyzer can deflect ions at different angles to achieve uniform angular distribution, avoiding the need for additional mechanical adjustment devices
2Manufacturing precision
If conventional beam angle adjustment methods are used, then angle correction is achieved, but beam path length increases
Solution Approach 1:
The mass analyzer serves dual purposes as both a mass filtering device and an angle adjustment mechanism. The same magnetic field structures used for mass analysis are configured to provide angular deflection, eliminating the need for additional beam path extensions that would be required by separate angle adjustment devices
3Device complexity
If no angle adjustment is performed, then system complexity remains low, but angular distribution becomes non-uniform leading to undesired implant properties
Solution Approach 1:
The mass analyzer is configured to provide angle correction as part of its standard operation, ensuring uniform angular distribution of ion beams without requiring additional adjustment mechanisms. This multi-functional approach maintains implant uniformity while avoiding increased system complexity
Solution Approach 2:
The system uses measured angle information from beam diagnostics to adjust the mass analyzer's magnetic field configuration, creating a feedback loop that ensures uniform angular distribution. This feedback mechanism achieves precise angle control using existing system components without adding complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Facilitates precise angle corrections during ion implantation, ensuring a uniform angular distribution of ion flux across the target workpiece, thereby improving implant properties and reducing system complexity.
Implementation Method 1
Mass analyzers typically employ a mass analysis magnet creating a dipole magnetic field to deflect various ions in an ion beam via magnetic deflection in an arcuate passageway which will effectively separate ions of different charge-to-mass ratios.
Implementation Method 2
The mass analyzer can be adjusted to accommodate for angle corrections to altered paths through the mass analyzer.
Data Source
AI summary
An ion implantation system employs a mass analyzer for both mass analysis and angle correction. An ion source generates an ion beam along a beam path. A mass analyzer is located downstream of the ion source that performs mass analysis and angle correction on the ion beam. A resolving aperture within an aperture assembly is located downstream of the mass analyzer component and along the beam path. The resolving aperture has a size and shape according to a selected mass resolution and a beam envelope of the ion beam. An angle measurement system is located downstream of the resolving aperture and obtains an angle of incidence value of the ion beam. A control system derives a magnetic field adjustment for the mass analyzer according to the angle of incidence value of the ion beam from the angle measurement system.