Ion Implanter Tilt Angle Control for Faster Implantation Evaluation

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Solution Overview

Problem

Existing ion implanters require multiple ion beams under different conditions for evaluation, necessitating a large number of devices and inefficient implantation angle changes.

Innovation Solution

An ion implanter with a tilt angle adjusting device and beam irradiation angle adjusting device allows rapid changes in implantation and irradiation angles by adjusting the workpiece holding device and beam transport device, respectively.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple ion beams under different conditions are used for evaluation, then implantation angle evaluation can be performed, but device complexity and quantity increase

Engineering Contradiction:

Improveimplantation angle evaluation capabilityVSAvoidnumber of ion beams and devices

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The workpiece holding device is made adjustable in tilt angle, allowing dynamic change of the implantation angle. Instead of using multiple fixed ion beams with different angles, a single ion beam is used while the workpiece tilt angle is dynamically adjusted to achieve different implantation angles, thereby reducing device complexity while maintaining evaluation capability

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The implantation angle parameter is changed by adjusting the tilt angle of the workpiece holding device rather than changing the ion beam parameters. This allows a single ion beam to be used for evaluating multiple implantation angles by simply changing the workpiece orientation, reducing the need for multiple ion beams and associated devices

Inventive Principle:

Principle #35Parameter changes

2Adaptability or versatility

If implantation angle is changed using conventional methods, then different implantation conditions can be achieved, but time consumption increases

Engineering Contradiction:

Improveimplantation angle variationVSAvoidtime for angle change

Core Design Contradiction:

Adaptability or versatilityVSLoss of time

Solution Approach 1:

The workpiece holding device incorporates a tilt angle adjusting mechanism that enables rapid dynamic adjustment of the workpiece orientation. This allows quick transition between different implantation angles without time-consuming reconfiguration, improving both adaptability and reducing time loss

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The tilt angle of the workpiece holding device can be pre-adjusted to the required implantation angle before ion beam irradiation begins. This preliminary positioning ensures that when evaluation is needed, the correct angle is already in place, minimizing time loss during the evaluation process

Inventive Principle:

Principle #10Preliminary action

Data Source

PatentUS20250323015A1Ion implanter and ion implantation method

Publication Date: 2025.10.16 SUMITOMO HEAVY IND ION TECH

AI summary

An ion implanter includes an ion source that generates ions, a beam transport device that transports an ion beam configured by the ions generated by the ion source to an implantation processing chamber, a workpiece holding device that is disposed in the implantation processing chamber and that holds a workpiece irradiated with the ion beam, a tilt angle adjusting device that adjusts a tilt angle of the workpiece held by the workpiece holding device, one or a plurality of processors, and one or a plurality of memories in which a program that is executable by the one or the plurality of processors is stored.