Ion-Ion Plasma Atomic Layer Etch Grid Filter

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Solution Overview

Problem

Plasma reactors with transverse electron beam sources often introduce asymmetries during workpiece processing, requiring additional features to mitigate these issues.

Innovation Solution

The design of an electron beam plasma reactor with a grid filter separating upper and lower chambers, allowing beam electrons to propagate while preventing non-beam electrons and ions, and utilizing RF power generators and magnetic fields to control plasma uniformity and ionization processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If a transverse electron beam source is used in a plasma reactor, then plasma generation is achieved, but asymmetries are introduced into the processing

Engineering Contradiction:

Improveplasma generationVSAvoidprocessing symmetry

Core Design Contradiction:

PowerVSManufacturing precision

Solution Approach 1:

The plasma reactor is divided into an upper chamber and a lower chamber separated by a grid filter. The electron beam source is positioned in the upper chamber, and the workpiece is placed in the lower chamber. This segmentation allows the beam electrons to be generated asymmetrically in the upper chamber while the grid filter ensures uniform plasma distribution in the lower chamber, resolving the symmetry issue while maintaining effective plasma generation.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

A grid filter is introduced as an intermediary component between the upper chamber (containing the electron beam source) and the lower chamber (containing the workpiece). The grid filter allows beam electrons to pass through while blocking non-beam electrons and ions, thereby mediating the transition from asymmetric beam generation to symmetric plasma processing in the lower chamber.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Power

If beam electrons are allowed to propagate to the lower chamber, then plasma is generated for processing, but non-beam electrons and ions contaminate the lower chamber

Engineering Contradiction:

Improveplasma generation in lower chamberVSAvoidcontamination by non-beam electrons and ions

Core Design Contradiction:

PowerVSObject-affected harmful factors

Solution Approach 1:

The grid filter serves as a selective intermediary that permits beam electrons to pass through to the lower chamber for plasma generation while blocking non-beam electrons and ions. This selective transmission mechanism enables effective plasma processing while preventing contamination from unwanted charged particles.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The grid filter creates different local conditions in different regions: in the upper chamber, all electrons are present for plasma generation, while in the lower chamber, only beam electrons are allowed to pass through. This local differentiation ensures that the lower chamber receives only the beneficial beam electrons while excluding harmful non-beam electrons and ions.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration ensures symmetrical processing by maintaining plasma uniformity and preventing asymmetrical effects, enhancing the precision and efficiency of workpiece treatment.

Implementation Method 1

allowing flow of at least a portion of said beam electrons from said upper chamber to said lower chamber while preventing flow of at least a portion of non-beam electrons and plasma ions from said upper chamber to said lower chamber; and producing a plasma in said lower chamber from said electron beam

Methodology Applied

Scientific EffectIonization: Ionisation

Implementation Method 2

The grid filter 104 allows at least a portion of the beam electrons to pass through the grid filter 104 into the lower chamber 100b, while preventing passage through the grid filter 104 of at least a portion of non-beam electrons and ions

Methodology Applied

Scientific EffectElectrostatic filtering: Electrostatics

Implementation Method 3

coupling RF source power into said upper chamber or to an electrode of said upper chamber to generate a plasma including beam electrons in said upper chamber

Methodology Applied

Scientific EffectRF plasma generation: Electromagnetic Induction