Ion Milling Apparatus Beam Forming Electrode Contamination Control
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Solution Overview
Problem
The existing ion milling apparatuses face contamination issues with the beam forming electrode due to the adherence of milled substances, which deteriorates the apparatus' performance, especially when the distance between the ion gun and the specimen is increased to reduce adherence, leading to lower milling performance.
Innovation Solution
The beam forming electrode is positioned between the cathode and the acceleration electrode within the ion gun, and an arbitrary voltage is applied to prevent contamination by blocking the milled substance from adhering to the electrode, allowing for efficient ion beam shaping and processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the distance between the ion beam source and the specimen is increased to reduce adherence of milled substance to the beam forming electrode, then contamination of the electrode is reduced, but the milling performance deteriorates
Solution Approach 1:
The beam forming electrode serves as an intermediary component positioned within the ion gun structure. By applying voltage to this electrode, the ion beam is shaped and directed toward the specimen. The electrode's strategic placement and electrical control allow it to form the beam while being protected from direct exposure to sputtered material, thus mediating between the ion source and specimen to reduce contamination while maintaining milling effectiveness
Solution Approach 2:
The invention utilizes voltage application to the beam forming electrode as a controllable parameter to shape and direct the ion beam. By adjusting the voltage, the beam profile can be optimized for different specimen processing needs. This parameter control allows the system to maintain high milling performance at appropriate distances without excessive contamination of the electrode
2Productivity
If a non-axisymmetric lens is disposed between the ion beam source and the specimen to process a wide area efficiently, then the ion beam is deformed to spread along the mask edge face, but the beam forming electrode becomes contaminated by adherent milled substance
Solution Approach 1:
The ion gun structure is segmented into distinct functional zones: the ion source region, the beam forming electrode region, and the specimen processing region. The beam forming electrode is positioned in its own dedicated space within the ion gun, separated from the direct path of sputtered material reaching the specimen. This segmentation allows the electrode to perform beam shaping functions while being protected from contamination
Solution Approach 2:
The beam forming electrode acts as an intermediary that shapes the ion beam into a non-axisymmetric profile for efficient wide-area processing. By controlling the voltage on this electrode, the beam is deformed to spread along the mask edge face as needed, while the electrode itself remains protected within the ion gun structure from direct exposure to adherent milled substance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses contamination of the beam forming electrode, maintaining high milling performance and efficiency while allowing for precise control of the ion beam profile to accommodate various specimen processing needs, including materials vulnerable to heat damage.
Implementation Method 1
The ion milling apparatus is a process unit which thins the specimen by utilizing a sputtering phenomenon where the specimen is bombarded with accelerated ions such that the ions sputter atoms and molecules
Implementation Method 2
a beam forming electrode for forming an ion beam
Data Source
AI summary
To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.