Ion Optical Device Electrode Fabrication via Precision Grinding
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Solution Overview
Problem
Existing methods for fabricating ion optical devices face challenges in achieving high precision and low surface charge, leading to defects such as inaccurate electrode formation and distortion of the quadrupole field, which affects the performance of mass analysis.
Innovation Solution
A method involving the use of high-hardness materials and high-precision machining techniques, including grinding and cutting processes, to create discrete ion optical electrodes with a high aspect ratio, minimizing surface charge accumulation and ensuring precise control over electrode contours.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography and corrosion processes are used to fabricate electrodes on printed circuit boards, then discrete electrodes can be formed, but the corrosion depth is insufficient and electrode morphology becomes trapezoidal, leading to poor position accuracy and field distortion
Solution Approach 1:
The patent replaces the chemical corrosion process with a mechanical grinding process using a grinding wheel. This substitution allows for precise control of electrode depth and morphology, achieving uniform cylindrical electrode shapes with accurate positions while avoiding the trapezoidal deformation and insufficient depth control inherent in corrosion methods.
2Manufacturing precision
If corrosion process is used to create deep grooves with high aspect ratio, then electrode depth can be increased, but corrosion time becomes excessively long and undermines electrode morphology
Solution Approach 1:
The patent replaces the time-consuming chemical corrosion process with a mechanical grinding process. The grinding wheel can rapidly remove material to achieve the required electrode depth and aspect ratio in a fraction of the time, while maintaining precise control over the final electrode morphology and avoiding the trapezoidal deformation that occurs during prolonged corrosion.
3Ease of manufacture
If planar structure is used to replace curved hyperbolic cylindrical surface, then machining difficulty is reduced, but field perfection deteriorates
Solution Approach 1:
The patent changes the geometric parameters of the electrodes by creating controlled depth variations through grinding. The grinding process removes material to a precise depth, creating electrodes with optimized dimensions that compensate for the planar structure's limitations. This parameter control allows the planar structure to achieve field quality comparable to curved surfaces while maintaining manufacturing ease.
Solution Approach 2:
The patent applies local quality by creating electrodes with specific depth characteristics at different locations through the grinding process. The grinding wheel selectively removes material to create electrodes with optimized local dimensions, ensuring that each electrode contributes optimally to the overall field distribution despite the planar substrate structure.
4Ease of manufacture
If FR4 epoxy resin fiberboard is used as substrate, then printed circuit board can be fabricated, but the material releases adsorbed gases in vacuum environment, making it unsuitable for ion trap operation
Solution Approach 1:
The patent uses a composite structure consisting of a glass substrate providing vacuum compatibility and metal electrodes providing electrical functionality. The glass material does not outgas in vacuum environments, making it suitable for ion trap operation, while the metal electrodes are added to provide the necessary electrical properties for field generation.
Solution Approach 2:
The patent extracts the problematic organic material (FR4 epoxy resin) from the substrate and replaces it with inorganic glass material that is vacuum-compatible. This extraction eliminates the outgassing issue while maintaining the structural and electrical functions required for ion trap operation.
Data Source
AI summary
The present invention provides a method for preparing an ion optical device. A substrate is fabricated with a hard material adapted for a grinding process, the substrate at least including a planar surface, and including at least one insulating material layer. Next, one or more linear grooves are cut on the planar surface, to form multiple discrete ion optical electrode regions on the planar surface separated by the linear grooves. Then, conductive leads are fabricated on other substrate surfaces than the planar surface and in a through hole inside the substrate, to provide voltages required on ion optical electrodes. By using high-hardness materials in cooperation with high-precision machining, higher precision and a desired discrete electrode contour can be obtained.


