Ion Trajectory Control in Ion Pump Cathodes

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Solution Overview

Problem

In ion pumps, the inefficient sputtering of material from cathode plates due to uncontrolled impact angles of positively charged ions leads to suboptimal particle trapping and vacuum maintenance, as ions often pass through the plates without immediate sputtering and lack controlled trajectories.

Innovation Solution

The introduction of surface structures and posts extending from the vacuum chamber wall towards the cathode plates, aligned with the openings of cylindrical anodes, creates an electric field that controls the trajectory of ions, ensuring they strike the cathode plates at optimal angles for efficient sputtering, thereby maximizing material deposition and vacuum efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If ions are accelerated toward the cathode plate without trajectory control, then the ion flux to the cathode is high, but the sputtering efficiency is low due to uncontrolled impact angles

Engineering Contradiction:
Improvesputtering efficiencyVSAvoidtrajectory control structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The cathode assembly is segmented into multiple components: the cathode plate, backing surface, and multiple surface structures (posts or protrusions) extending from the backing surface. These segmented elements work together to control ion trajectories while maintaining high ion flux, resolving the contradiction between sputtering efficiency and structural complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The surface structures (posts or protrusions) act as intermediary elements between the uncontrolled ion flux and the cathode plate. These intermediaries guide and focus the ions onto the cathode at optimal angles for sputtering, thereby improving efficiency without requiring complete redesign of the ion source or acceleration field.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Strength

If the cathode plate is made thicker to improve structural strength, then the mechanical strength increases, but the sputtering efficiency decreases because ions may pass through without proper interaction

Engineering Contradiction:
Improvecathode structural strengthVSAvoidsputtering efficiency
Core Design Contradiction:
StrengthVSProductivity

Solution Approach 1:

The cathode system is divided into the cathode plate (for structural strength) and separate surface structures on the backing surface (for ion guidance). This segmentation allows the plate to be thick and strong while the surface structures optimize ion interaction, resolving the contradiction between strength and sputtering efficiency.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Instead of relying solely on cathode plate thickness (one dimension) to control ion interaction, the invention introduces surface structures that extend into the ion path from the backing surface. This adds a new dimensional approach to ion-cathode interaction, allowing optimal sputtering angles to be achieved independent of plate thickness.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Productivity

If surface structures are added to control ion trajectories, then the sputtering efficiency improves, but the manufacturing complexity increases

Engineering Contradiction:
Improvesputtering efficiencyVSAvoidcathode assembly manufacturing
Core Design Contradiction:
ProductivityVSEase of manufacture

Solution Approach 1:

The surface structures are merged with the cathode assembly, where the backing surface and surface structures form an integrated unit. This merging simplifies manufacturing by reducing the number of separate components that need to be assembled, while still providing the trajectory control functionality needed for high sputtering efficiency.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances the sputtering efficiency by directing ions to strike the cathode plates within a desired range of angles, increasing the amount of material sputtered and improving the overall performance of the ion pump in maintaining ultra-high vacuum conditions.

Implementation Method 1

An electrical potential is applied between the anode and the cathode... The resulting positively charged ion is accelerated by the electrical potential between the anode and the cathode toward one of the cathode plates

Methodology Applied
Scientific EffectElectrical potential difference: Electric Field

Implementation Method 2

magnets on opposite sides of the cathode plates generate a magnetic field that is aligned with the axes of the anode cylinders... trapping electrons within the cylindrical anodes through a combination of the electrical potential and the magnetic field

Methodology Applied
Scientific EffectMagnetic field: Magnetic Field

Implementation Method 3

The introduction of surface structures and posts extending from the vacuum chamber wall towards the cathode plates, aligned with the openings of cylindrical anodes, creates an electric field that controls the trajectory of ions

Methodology Applied
Scientific EffectElectric field from surface structures: Electric Field

Implementation Method 4

The positively charged ion is eventually trapped by the cathode and is thereby removed from the evacuated space. Typically, the positively charged ion is trapped through a sputtering event in which the positively charged ion causes material from the cathode to be sputtered into the vacuum chamber of the pump

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS10550829B2Ion trajectory manipulation architecture in an ion pump
Publication Date: 2020.02.04 EDWARDS VACUUM LLC
  • US10550829B2 patent drawing
  • US10550829B2 patent drawing
  • US10550829B2 patent drawing

AI summary

An ion pump includes an anode, a backing surface having at least one surface structure extending toward the anode and a cathode positioned between the anode and the backing surface and having an opening such that the at least one surface structure is aligned with and extends from the backing surface towards the opening.