Non-Planar Ion Source Endplate for Plasma Erosion Resistance
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Solution Overview
Problem
In ion implantation systems without a repeller, the second end plate is susceptible to erosion and deposition from plasma, leading to potential damage and reduced lifespan.
Innovation Solution
Implementing a non-planar second end plate with inward facing protrusions or indentations to counteract plasma effects, using additive manufacturing to minimize material usage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the second end plate is made thicker to protect against plasma erosion, then the reliability and lifetime of the end plate is improved, but the material consumption and manufacturing cost increase
Solution Approach 1:
The patent applies local quality by making the second end plate thicker only in the specific region where plasma erosion occurs (the region facing the arc chamber) while maintaining the original thickness in other areas. This selective thickening protects the critical erosion-prone area without unnecessarily increasing material consumption throughout the entire component.
Solution Approach 2:
The patent segments the second end plate into regions with different thicknesses - a thicker erosion-resistant region facing the plasma source and a thinner region in areas less susceptible to erosion. This segmentation allows optimized material distribution that balances protection needs with material efficiency.
2Reliability
If a repeller is added to protect the second end plate from plasma damage, then the reliability of the end plate is improved, but the device complexity increases
Solution Approach 1:
The patent extracts the plasma protection function from the repeller component and integrates it directly into the second end plate structure itself. By making the end plate thicker in the erosion-prone region, the protection function is built into the base component, eliminating the need for a separate repeller assembly and reducing overall device complexity.
Solution Approach 2:
The patent merges the protective function with the structural function by making the second end plate itself the protective element through selective thickening. This combines the structural support role and the plasma erosion protection role into a single integrated component, eliminating the need for separate protective elements like repellers.
3Object-affected harmful factors
If the entire second end plate is made thicker, then the protection against plasma erosion is improved, but the manufacturing cost and material usage increase significantly
Solution Approach 1:
The patent applies local quality by concentrating the additional material thickness only in the specific region of the second end plate that is exposed to plasma erosion (the region facing the arc chamber). This localized thickening provides erosion resistance where needed while avoiding unnecessary material consumption in areas not exposed to plasma, thereby reducing total material usage compared to uniform thickening.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Extends the lifetime of the second end plate and reduces material consumption while maintaining system functionality.
Implementation Method 1
the plasma has the ability to erode the second end plate
Implementation Method 2
the non-planar second end plate serves to counteract the effect of the plasma on the second end plate
Data Source
AI summary
An ion source that includes a cathode near a first end plate and a non-planar second end plate is disclosed. The non-planar second end plate serves to counteract the effect of the plasma on the second end plate. In some embodiments, the plasma has the ability to erode the second end plate. Rather than making the entire second end plate thicker, the second end plate is only made thicker in the regions that are affected by the plasma. In this way, less material is used in the production of the second end plate, and increased lifetime is achieved. This concept may also be used in environments where the plasma serves to deposit material on the second end plate.


