Ion Beam Source Assembly Gap Height Control
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Solution Overview
Problem
Nano-Aperture Ionization Sources (NAIS) face performance issues such as unpredictability in beam brightness, emission current, beam energy spread, and virtual source size due to complex dependencies on gas flow conductance and ion behavior in the ionization space, making it challenging to optimize their performance for various applications.
Innovation Solution
The solution involves adjusting the gap height between the retaining plates in the NAIS to maintain an optimal ionic scattering quotient (QS) within a specific range, allowing for concurrent adjustment of other parameters like operating pressure to ensure consistent ion beam properties, and using a selecting device to choose the appropriate NAIS module for different operational regimes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the gap height between retaining plates is adjusted to optimize ion beam properties, then beam brightness and energy spread improve, but device complexity increases due to multiple adjustable parameters
Solution Approach 1:
The patent applies parameter changes by systematically adjusting the gap height between retaining plates to control the ionic scattering quotient (QS). By changing this geometric parameter, the invention optimizes ion beam properties such as brightness and energy spread without requiring multiple separate components, thus improving beam quality while managing device complexity through controlled parameter variation.
2Adaptability or versatility
If multiple NAIS modules are used to operate in different regimes, then versatility improves, but device complexity increases
Solution Approach 1:
The patent applies dynamics by making the gap height between retaining plates adjustable rather than fixed. This dynamic parameter allows a single NAIS module to adapt to different operational regimes by changing the ionic scattering quotient (QS) to match desired ion beam properties. This eliminates the need for multiple separate NAIS modules, achieving versatility while reducing device complexity.
3Quantity of substance
If gas flow conductance is increased to improve ion production, then emission current increases, but beam brightness becomes unpredictable
Solution Approach 1:
The patent applies feedback by establishing a controlled relationship between gas flow conductance and the gap height parameter. By adjusting the gap height to achieve an optimal ionic scattering quotient (QS), the system provides predictable beam brightness while maintaining adequate emission current. This feedback mechanism ensures that changes in gas flow are compensated by corresponding adjustments in gap height, maintaining reliability.
4Manufacturing precision
If the ionization space is enlarged to reduce ion scattering, then energy spread improves, but virtual source size increases
Solution Approach 1:
The patent applies parameter changes by using the gap height between retaining plates as a control parameter for the ionic scattering quotient (QS). By optimizing this parameter, the invention achieves the right balance between reducing ion scattering (improving energy spread) and maintaining an appropriate virtual source size. This controlled parameter adjustment allows simultaneous optimization of both energy spread and source characteristics.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables predictable tuning of ion beam properties, allowing for high brightness and low energy spread, and enables operation in various regimes, including high current and monochromaticity, by ensuring the ionic scattering quotient remains within an acceptable range, thus improving the reliability and versatility of NAIS sources.
Implementation Method 1
a collision ionization ion source configured to produce an ion beam from a charged particle beam incident on an input zone of the collision ionization ion source
Implementation Method 2
two oppositely-located retaining plates... one of which contains an input zone to admit said input beam and the other of which contains an oppositely located output aperture to allow emission of a flux of ions
Data Source
AI summary
A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.