Ion Source Venting Using Air Reaction to Remove Residual Halogen
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Solution Overview
Problem
Current ion beam irradiation apparatuses require a long time to reduce halogen gas concentration to a low level before maintenance, hindering quick start-up of ion source maintenance due to the use of inert gases like nitrogen, which is inefficient in reducing halogen gas concentrations.
Innovation Solution
The apparatus employs an air supply passage to react with residual halogen gases, quickly reducing their concentration by using water components in the air, and includes a nitrogen supply passage for cooling the plasma generation container to facilitate faster maintenance, along with a measuring device to monitor temperature and prevent oxidation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If inert gas (nitrogen) is used to reduce halogen gas concentration, then the ion source can be maintained, but the process takes a long time and is inefficient
Solution Approach 1:
The patent changes the chemical composition parameter of the gas used for pressure equalization from inert gas (nitrogen) to air containing water vapor. This parameter change enables chemical reaction with residual halogen gas, transforming a physically limited process into a chemically active one that rapidly reduces halogen gas concentration.
Solution Approach 2:
The patent converts the potentially harmful residual halogen gas into a beneficial reaction product by introducing water-containing air. The halogen gas that would otherwise need to be slowly evacuated reacts with water to form halogen hydrates, rapidly reducing the halogen gas concentration and enabling faster maintenance start-up.
2Productivity
If air is supplied to quickly reduce halogen gas concentration, then maintenance can start faster, but there is risk of oxidation of components
Solution Approach 1:
The patent applies partial action by controlling the air supply to be sufficient for reacting with residual halogen gas but not excessive to cause significant oxidation. The air supply amount is optimized to achieve the minimum necessary water vapor introduction for halogen gas removal while limiting oxidative damage to components.
Solution Approach 2:
The patent performs preliminary action by conducting the air supply and halogen gas reaction before maintenance operations begin. This preliminary treatment removes the harmful halogen gas in advance, creating a safe environment for subsequent maintenance work without exposing components to prolonged oxidative conditions.
3Device complexity
If nitrogen is used to bring the vacuum chamber to atmospheric pressure, then the process is simple, but it takes a long time and does not quickly remove halogen gas
Solution Approach 1:
The patent changes the gas composition parameter from pure nitrogen to air, introducing water vapor as a reactive component. This single parameter change transforms the pressure equalization process from a slow physical evacuation to a rapid chemical reaction process that simultaneously achieves pressure equalization and halogen gas removal.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for rapid reduction of halogen gas concentrations, enabling quicker start-up of ion source maintenance and preventing component oxidation by using air instead of nitrogen, thus shortening the time to bring the ion source to atmospheric pressure.
Implementation Method 1
supplying the air to the vacuum chamber, and evacuating a reaction product between the air and residual halogen gas
Implementation Method 2
react with residual halogen gases, quickly reducing their concentration by using water components in the air
Implementation Method 3
includes a nitrogen supply passage for cooling the plasma generation container
Data Source
AI summary
An ion beam irradiation apparatus includes a plasma generation container in which plasma is generated, a vaporizer connected to the plasma generation container, a halogen gas supply passage through which a halogen gas is supplied to the vaporizer, an air supply passage through which air is supplied to the vaporizer, and an evacuation passage through which a reaction product produced through a reaction between the halogen gas and the air is evacuated to an outside of the ion beam irradiation apparatus.


