Ion Source Head Oblique Coil Winding for Plasma Efficiency
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Solution Overview
Problem
Existing ion implantation apparatuses face challenges in precisely implanting ions into semiconductor surfaces without damaging the target and achieving high ion density, as they often result in horizontal particle movements and inefficient plasma generation.
Innovation Solution
An ion source head with a reaction chamber and a coil configuration, where the coil is wound spirally on the outer surface of the chamber in an oblique direction, generating an electromagnetic force perpendicular to the height direction, reducing ion acceleration length and improving plasma generation efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional coil configuration is used in the ion source head, then the structure is simple, but plasma generation efficiency is low and ion acceleration length is excessive
Solution Approach 1:
The coil is divided into multiple independent coils (first coil, second coil, third coil) wound on different regions (lower, central, upper) of the reaction chamber. Each coil can be controlled independently to generate electromagnetic forces in specific directions, improving plasma generation efficiency while maintaining manageable structural complexity through modular design
Solution Approach 2:
The second coil is wound in an oblique direction (at an angle θ of 30° to 60°) relative to the vertical axis, introducing a dimensional change in the coil winding orientation. This oblique configuration generates electromagnetic forces with both vertical and radial components, effectively reducing ion acceleration length and improving plasma generation efficiency without excessive structural complexity
2Productivity
If ion acceleration length is reduced to improve plasma generation efficiency, then plasma generation efficiency increases, but ion density control becomes more difficult
Solution Approach 1:
Different regions of the reaction chamber are equipped with coils having different winding directions and characteristics (first coil vertical, second coil oblique, third coil vertical). This local differentiation allows tailored electromagnetic force distribution, achieving both reduced ion acceleration length in critical regions and precise ion density control through localized field adjustment
Solution Approach 2:
The independent control of multiple coils with different orientations enables feedback-based adjustment of electromagnetic forces. By monitoring plasma generation efficiency and ion density, the coil currents can be adjusted to optimize both the reduction of ion acceleration length and the maintenance of precise ion density control
3Productivity
If electromagnetic force is generated along the height direction only, then the coil winding is simple, but ion acceleration length is excessive and plasma generation efficiency is low
Solution Approach 1:
The second coil is wound at an oblique angle θ (30° to 60°) relative to the vertical axis, introducing a radial component to the electromagnetic force generation. This dimensional change in coil orientation creates a more effective electromagnetic force distribution that reduces ion acceleration length and improves plasma generation efficiency while maintaining reasonable winding complexity
Solution Approach 2:
The coil configuration uses asymmetric winding directions: the first and third coils are wound vertically while the second coil is wound obliquely. This asymmetric arrangement optimizes the electromagnetic force distribution throughout the reaction chamber, achieving better plasma generation efficiency and shorter ion acceleration length without excessive winding complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances plasma generation efficiency, decreases ion byproducts, and increases ion density by reducing the ion acceleration length, allowing for precise and effective ion implantation into semiconductor surfaces.
Implementation Method 1
the coil may be configured to generate an electromagnetic force along a height direction of a reaction chamber and an oblique direction with respect to the height direction
Data Source
AI summary
An ion source head may include a reaction chamber and a coil. The reaction chamber may be configured to provide an ionization space. The reaction chamber may be divided into a lower region, a central region and an upper region. The coil may be configured to be wound on an outer surface of the reaction chamber. The coil may include a first coil, a second coil and a third coil. The first coil may be spirally wound on an outer surface of the lower region of the reaction chamber. The second coil may be wound on the central region of the reaction chamber. The third coil may be spirally wound on an outer surface of the upper region of the reaction chamber. The second coil may be connected between the first coil and the third coil. The second coil may have a winding direction obliquely to a winding direction of the first and third coils.