Ion Source Arc Chamber Inert Gas Separation Layer
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Solution Overview
Problem
The existing ion implanter devices face a significant reduction in service life due to the formation of a conductive film on the inner surfaces of the arc chamber, caused by by-products and impurity particles from the ionization process, which can lead to short-circuits and instability of the filament.
Innovation Solution
Incorporating a cleaning gas inlet for an inert gas, such as argon, which is ionized into a chemically inactive plasma that forms a separation layer within the arc chamber, preventing the conductive film formation and carrying away fallen particles, thereby extending the service life of the ion source device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If ion source gas is ionized in the arc chamber to generate plasma, then ion beam quality is achieved, but conductive film forms on the arc chamber surface reducing service life
Solution Approach 1:
An inert gas (such as argon) is introduced as an intermediary substance between the ion source gas and the arc chamber wall. This inert gas forms a protective layer that prevents direct contact between the ionized plasma and the chamber surface, thereby preventing conductive film formation while allowing the ion beam generation process to continue
Solution Approach 2:
The patent introduces an inert gas into the arc chamber to create an inert atmosphere that chemically isolates the reactive plasma from the arc chamber wall. This inert environment prevents the formation of conductive films by eliminating the chemical reactions that would otherwise occur between the plasma by-products and the chamber surface
2Duration of action of stationary object
If cleaning gas is introduced to prevent conductive film formation, then service life is extended, but device complexity increases
Solution Approach 1:
The inert gas inlet system serves multiple functions: it prevents conductive film formation on the arc chamber wall, maintains plasma stability, and can be used for chamber cleaning between runs. This multi-functionality reduces the need for separate dedicated cleaning systems, thereby limiting the increase in device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The inert cleaning gas plasma effectively separates the ion source plasma from the arc chamber surfaces, reducing conductive film formation and enhancing the longevity of the ion source device by preventing short-circuits and maintaining stability.
Implementation Method 1
The filament 103 is located on the sidewall of the arc chamber 100. When connected to a power supply, the filament 103 heats up to generate thermo-electrons.
Implementation Method 2
The ion source gas is ionized into a plasma by colliding with the thermo-electrons generated by the filament 103.
Implementation Method 3
An inert cleaning gas can be introduced into the arc chamber through a cleaning gas inlet such that the thermo-electrons ionize at least a portion of the inert cleaning gas into a first plasma
Implementation Method 4
The reflector 102, when connected to a power supply, is used to reflect the thermo-electrons generated by the filament 103 in order to prevent the thermo-electrons from being lost through the body of the arc chamber 100.
Data Source
AI summary
Various embodiments provide an ion source device and a method for providing the ion source. An exemplary ion source device can include an arc chamber, a filament, a reflector, a slit outlet, a source gas inlet, and/or a cleaning gas inlet. The filament can be configured to generate thermo-electrons in the arc chamber. The reflector can be configured to reflect the thermo-electrons back to the arc chamber. The slit outlet can be configured to exit a gaseous material out of the arc chamber. The source gas inlet and the cleaning gas inlet can be located on a same sidewall of the arc chamber configured to respectively introduce an ion source gas and an inert cleaning gas into the arc chamber.