Ion Source Inside Mass Analyzing Magnet for Compact High-Current Implantation
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Solution Overview
Problem
Conventional ion implanters have a large size requirement and are unable to achieve high-dose implantation at practical throughput, especially for low-energy and high-dosage ion beam profiles, due to their design limitations and the need for pure species and energy.
Innovation Solution
An improved ion implanter design with the ion source positioned inside a mass analyzing magnet, utilizing the magnetic field to generate plasma and a mass resolving slit within the magnet to produce a ribbon beam with high current and controllable angle, allowing for a more compact and efficient ion beam generation system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the ion source is positioned outside the mass analyzing magnet with conventional design, then the system can operate with simpler configuration, but the system requires large facility size and cannot achieve high-dose implantation at practical throughput
Solution Approach 1:
The ion source is merged with the mass analyzing magnet by positioning the ion source inside the magnet's bore, combining two previously separate components into one integrated system. This reduces the overall facility size while maintaining the mass analysis function and enables higher beam current throughput.
Solution Approach 2:
The ion source is nested within the mass analyzing magnet structure, placing one component inside another. The ion source resides in the central region of the magnet, utilizing the magnet's internal space to achieve compact configuration without compromising the mass analysis performance.
2Productivity
If conventional ion implantation systems use external mass resolving aperture, then the system can achieve mass separation, but the system cannot achieve high-dose implantation at practical throughput
Solution Approach 1:
The mass analyzing magnet performs preliminary mass separation of ion species before the ions reach the extraction region. By pre-separating the ion species within the magnet's magnetic field, the system achieves both high beam current and sufficient species purity for practical implantation applications.
3Area of stationary object
If the mass resolving slit is positioned outside the mass analyzing magnet, then the system can achieve mass resolution, but the system requires larger footprint and cannot achieve compact operation
Solution Approach 1:
The mass resolving function is merged into the mass analyzing magnet by utilizing the magnet's own magnetic field for mass separation. The exit aperture of the ion source serves as the effective mass resolution point, eliminating the need for separate external mass resolving slits and reducing the system footprint.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new design achieves higher beam current and stability, enabling higher throughput and more compact operation while maintaining control over the ion beam's angle and energy, addressing the limitations of conventional systems.
Implementation Method 1
The analyzer magnet is configured to bend the ion beam from the ion source within the chamber along the curved path to spatially separate one or more ion species in the ion beam
Implementation Method 2
an ion source positioned and installed inside of a mass analyzing magnet, where the magnetic field of the mass analyzer magnet is used to generate plasma in the ion source
Data Source
AI summary
An ion source is provided that includes a gas source for supplying a gas, and an ionization chamber defining a longitudinal axis extending therethrough and including an exit aperture along a side wall of the ionization chamber. The ion source also includes one or more extraction electrodes at the exit aperture of the ionization chamber for extracting ions from the ionization chamber in the form of an ion beam. At least one of the extraction electrodes comprises a set of discrete rods forming a plurality of slits in the at least one extraction electrode for enabling at least one of increasing a current of the ion beam or controlling an angle of extraction of the ion beam from the ionization chamber. Each rod in the set of discrete rods is parallel to the longitudinal axis of the ionization chamber.