Ion Source Plenum Aperture Layout for Uniform Ribbon Beams
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Solution Overview
Problem
Existing ion sources fail to achieve uniform plasma distribution for generating a ribbon ion beam, leading to inconsistent ion implantation in targets.
Innovation Solution
The ion source incorporates a plenum chamber with a plenum plate featuring a longitudinal aperture and a vaporizer, along with gas feed chambers and an ionization chamber, to ensure uniform dispersion of gases and vapors, resulting in a uniform plasma density for a consistent ribbon ion beam.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional plenum structure is used to generate plasma, then the ion source can operate, but the plasma uniformity is insufficient for generating a consistent ribbon ion beam
Solution Approach 1:
The plenum is divided into multiple plenum chambers, each with its own plenum plate containing apertures. This segmentation allows independent control and optimization of vapor distribution in different regions, enabling uniform plasma generation across the entire ribbon beam width while maintaining manageable structural complexity
Solution Approach 2:
Each plenum plate is configured with apertures of specific sizes, shapes, and distributions tailored to local requirements. The vaporizer apertures and gas feed chamber apertures are designed with different characteristics to optimize local vapor-gas mixing and plasma formation, achieving overall plasma uniformity through localized optimization
2Ease of manufacture
If the vaporizer and gas feed system are simplified, then the device is easier to manufacture, but the dispersion uniformity of gases and vapors deteriorates
Solution Approach 1:
The vapor delivery system is segmented into multiple plenum chambers with distributed apertures, and the gas feed system is divided into multiple gas feed chambers. This segmentation creates multiple simple, identical modules that are easy to manufacture while achieving uniform dispersion through their collective distributed arrangement
Solution Approach 2:
The plenum chambers act as intermediary structures between the vaporizer and the ionization chamber. These intermediaries provide a controlled environment for vapor-gas mixing and distribution, simplifying the overall design while ensuring uniform dispersion through their structured aperture configurations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the uniformity of the plasma, enabling efficient and consistent ion implantation into targets, reducing maintenance needs and improving manufacturing precision.
Implementation Method 1
a vaporizer configured to produce a vapor
Implementation Method 2
ensure uniform dispersion of gases and vapors
Implementation Method 3
an ionization chamber which is in fluid communication with both to the plenum chamber through the longitudinal aperture and to the plurality of gas feed chambers
Data Source
AI summary
An ion source includes a vaporizer that produces a vapor from a solid raw material, and a plenum including a plenum chamber having a first wall through which the vaporizer is in fluid communication with an interior of the plenum chamber, and a second wall opposite the first wall. The second wall includes a plenum plate with a longitudinal aperture therein.