Ion Source Wiper Mechanism for Aperture Cleaning
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Solution Overview
Problem
Ion source extraction apertures suffer from undesirable deposits, such as tungsten, carbon, and boron, which affect beam uniformity and ion source lifetime, and conventional cleaning techniques are time-consuming and impact throughput.
Innovation Solution
A wiper mechanism positioned within the arc chamber is driven to operational positions to clean the extraction aperture, effectively removing deposits in a short time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional cleaning gas techniques are used to remove deposits from the extraction aperture, then the deposits are removed and beam uniformity is improved, but the cleaning process takes 10-60 minutes which adversely impacts throughput
Solution Approach 1:
The patent replaces the chemical cleaning system (cleaning gas flow) with a mechanical cleaning system (wiper assembly). The wiper is driven by an actuator to physically contact and remove deposits from the extraction aperture surface, substituting mechanical action for chemical processes and significantly reducing cleaning time from 10-60 minutes to a much shorter duration, thereby improving throughput while maintaining beam uniformity
Solution Approach 2:
The patent employs a pneumatic actuator to drive the wiper assembly across the extraction aperture. compressed gas is used to power the actuator, which in turn moves the wiper mechanism. This pneumatic drive system provides efficient, controlled mechanical motion for the cleaning operation, enabling rapid deposit removal without requiring prolonged cleaning gas exposure
2Reliability
If cleaning gas techniques are used to remove deposits, then deposits are removed, but the process requires high flow rates and long durations which consume excessive time and resources
Solution Approach 1:
The patent replaces the time-consuming chemical cleaning process with a rapid mechanical wiping action. The wiper assembly physically removes deposits through direct contact and scraping motion, achieving effective deposit removal in a fraction of the time required for cleaning gas techniques, thus reducing cleaning operation time from 10-60 minutes to seconds or minutes
Solution Approach 2:
The wiper assembly is positioned and ready to clean the extraction aperture at predetermined intervals during operation. By proactively removing deposits before they significantly degrade beam uniformity, the system maintains reliable performance without requiring lengthy corrective cleaning operations, thereby reducing overall cleaning time and improving operational efficiency
3Manufacturing precision
If beam current levels are reduced to improve beam uniformity caused by deposits, then beam uniformity is improved, but throughput and productivity are adversely impacted
Solution Approach 1:
The wiper assembly enables the ion source to maintain its own extraction aperture cleanliness through automated periodic cleaning. By removing deposits that would otherwise necessitate beam current reduction, the self-cleaning system allows the source to operate at optimal beam current levels continuously, maintaining both beam uniformity and high throughput without compromise
Solution Approach 2:
The system implements periodic cleaning cycles where the wiper assembly is activated at predetermined intervals to remove accumulating deposits. This periodic maintenance prevents deposit buildup from degrading beam uniformity, allowing the ion source to operate at full beam current between cleaning cycles, thus maintaining both quality and productivity
Data Source
AI summary
An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.