Ionic Liquid Holder for Plasma Etching Component Protection
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Solution Overview
Problem
Conventional plasma processing apparatuses face productivity issues due to the consumption and degradation of components like silicon focus rings and quartz components during etching, requiring frequent maintenance and replacement, which cannot completely restore the processing chamber's state.
Innovation Solution
Incorporating an ionic liquid holder within the processing chamber to store and circulate ionic liquid, which acts as an alternative to consumed components, reducing maintenance needs by replenishing and filtering the liquid without stopping the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional solid components (silicon focus ring, quartz components) are used in the processing chamber, then the apparatus structure is simple and easy to manufacture, but the components are consumed and degraded during etching, requiring frequent maintenance and replacement
Solution Approach 1:
The patent replaces solid components with ionic liquid, utilizing fluid properties to perform the same function. The ionic liquid is circulated through the processing chamber using hydraulic principles, allowing continuous operation without component consumption or degradation, thereby resolving the contradiction between reliability and device complexity
Solution Approach 2:
The patent changes the physical state of the component from solid (focus ring, quartz components) to liquid (ionic liquid). This parameter change allows the component to be replenished and filtered without stopping the apparatus, improving reliability while managing complexity through automated fluid circulation systems
2Productivity
If solid components are used in the processing chamber, then the apparatus structure is simple, but productivity decreases due to frequent maintenance and replacement operations
Solution Approach 1:
The patent implements continuous circulation of ionic liquid through the processing chamber, allowing the useful action of component protection to continue without interruption. The liquid can be replenished and filtered without stopping the apparatus, ensuring continuous operation and high productivity
Solution Approach 2:
The ionic liquid system performs self-replenishment and self-filtering through automated circulation. The liquid automatically flows through the processing chamber, picks up consumed components, and is filtered without requiring manual intervention, enabling continuous operation and improving productivity
3Reliability
If ionic liquid is used to replace consumed components, then component consumption is suppressed and continuous operation is enabled, but the device complexity increases due to liquid storage and circulation systems
Solution Approach 1:
The ionic liquid serves multiple functions simultaneously: it protects components from consumption, maintains processing stability, and can be easily replenished and filtered. This multi-functionality justifies the added complexity by providing comprehensive solutions to multiple problems with a single system
Solution Approach 2:
The patent changes the physical state from solid to liquid, enabling the component to be circulated, replenished, and filtered. This parameter change allows the system to manage complexity through automated fluid handling while maintaining processing stability and preventing component degradation
Data Source
AI summary
In a processing chamber, a processing target substrate is placed and a substrate processing is performed. A holder is configured to store therein an ionic liquid as some or all of components to be consumed or degraded by the substrate processing within the processing chamber.