Ionization Chamber Heated-Gas Flow to Prevent Probe Contamination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing ionization devices suffer from internal contamination of the heated-gas supply mechanism due to charged droplets entering when there is no heated gas being expelled, causing contamination and requiring frequent cleaning.
Innovation Solution
An ionization device with a heated-gas supply mechanism that continuously expels gas in a direction intersecting with the liquid sample spray, controlled by a controller to ensure gas expulsion regardless of user operation, preventing droplets from entering the mechanism.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the heated-gas supply mechanism is provided apart from the ionization probe to enable independent gas expulsion control, then the flexibility in setting gas expulsion timing is improved, but the risk of internal contamination of the heated-gas supply mechanism increases due to charged droplets entering when no gas is being expelled
Solution Approach 1:
The controller automatically initiates gas expulsion from the heated-gas supply mechanism before the ionization probe starts spraying the liquid sample and continues it after spraying stops. This preliminary and extended gas expulsion creates a protective gas flow that prevents charged droplets from entering the heated-gas supply mechanism during transitions when the probe is not actively spraying, thereby resolving the contamination issue while preserving operational flexibility
Solution Approach 2:
The system maintains continuous gas expulsion from the heated-gas supply mechanism throughout the entire sampling process, including during periods when the ionization probe is not actively spraying. This continuous action ensures that the gas flow consistently prevents charged droplets from entering the heated-gas supply mechanism, eliminating the contamination risk associated with intermittent operation while maintaining the ability to control gas expulsion timing
2Object-affected harmful factors
If gas expulsion from the heated-gas supply mechanism is made automatic and continuous during sample spraying, then the prevention of charged droplet entry and contamination is improved, but the gas consumption increases
Solution Approach 1:
The controller starts gas expulsion from the heated-gas supply mechanism before the ionization probe begins spraying and continues it after spraying stops. This timing strategy ensures continuous protection against charged droplet entry during critical transition periods while limiting gas consumption to only the necessary duration surrounding the actual sampling process
Solution Approach 2:
Gas expulsion is maintained continuously throughout the sampling process including during probe inactivity periods, ensuring uninterrupted protection against contamination. The system optimizes this continuous action by precisely coordinating the start and stop times with the sampling schedule, thereby maintaining effective protection while minimizing unnecessary gas consumption during non-sampling intervals
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents contamination of the heated-gas supply mechanism by ensuring continuous gas expulsion during sample spraying, reducing the need for frequent cleaning and enhancing device robustness.
Implementation Method 1
a heated-gas supply mechanism configured to expel the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe
Implementation Method 2
a heated-gas supply mechanism including a gas supply source and a heating section for heating a gas supplied from the gas supply source
Implementation Method 3
an ionization probe configured to spray a liquid sample
Data Source
AI summary
In an ionization device for an ionization chamber (11) separated from an analysis chamber (12-14) by a partition wall having an ion introduction port (113), an ionization probe (111) sprays a liquid sample. A heated-gas supply mechanism (112), which includes a gas supply source and a heating section (1122) for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller (32) controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.