IR Image Artifact Detection Using Histogram Regression
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Solution Overview
Problem
Existing methods for detecting IR illumination leakage artifacts in IR camera systems are unreliable in uncontrolled environments, particularly due to false classifications from variance analysis and edge-based methods, and deep learning is computationally demanding.
Innovation Solution
A method using frame segmentation, histogram analysis, and regression line fitting to distinguish artifacts from real objects based on smooth gradients, without edge detection, and employing frame subtraction to enhance artifact visibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If variance analysis of edge pixels is used to detect artifacts, then the detection process is simple, but false classifications occur because variance loses transition information
Solution Approach 1:
The patent changes the detection parameter from variance (which loses transition information) to a method that preserves and analyzes the actual pixel intensity transitions. By computing the difference between adjacent pixel values and analyzing the distribution of these differences, the system maintains the transition information needed for reliable artifact detection while keeping the process computationally simple.
2Measurement precision
If ESF analysis is used to evaluate edge characteristics, then adequate results are obtained in controlled environments, but the method fails in uncontrolled environments where artifact shapes are unknown or edges cannot be identified
Solution Approach 1:
The patent extracts only the essential characteristic needed for artifact detection - the smoothness of intensity transitions - without requiring full ESF analysis or edge identification. By computing pixel differences and analyzing their distribution directly, the method obtains the necessary measurement precision while being adaptable to any environment, including uncontrolled ones where artifact shapes are unknown.
Solution Approach 2:
Instead of trying to identify edges and then analyze their characteristics (the traditional ESF approach), the patent inverts the approach by directly analyzing the intensity transitions themselves. This inversion eliminates the need for edge identification and makes the method universally applicable to all artifact types regardless of shape or environment.
3Reliability
If deep learning is used for artifact classification, then detection accuracy is improved, but computational demands become too high for practical use
Solution Approach 1:
The patent replaces the expensive, complex deep learning model with a simple, computationally inexpensive statistical method. By using basic operations like pixel difference calculation and distribution analysis, the system achieves reliable artifact classification accuracy with minimal computational energy consumption, making it suitable for resource-constrained embedded systems.
Data Source
AI summary
The present disclosure relates to a computer implemented method for detecting artifacts in infrared (IR) illuminated IR images. Artifacts are separated from real objects by analyzing results of regression line fits to histograms of pixel values. Artifacts will have smooth transition gradients and therefore will show smaller deviations of the regression line fit to the histogram data.


