IR Spectroscopy Monitoring for Semiconductor Process Chemistry Control
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Solution Overview
Problem
Existing semiconductor processing systems lack real-time monitoring of process chemicals, leading to uncontrolled changes in chemistry that negatively impact device metrics such as film thickness and critical dimension uniformity.
Innovation Solution
The implementation of an infrared (IR) monitoring system within semiconductor processing systems to monitor the composition and concentration of process chemicals and by-products in real-time, using IR spectroscopy techniques to adjust process conditions dynamically.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional semiconductor processing systems are used without real-time monitoring, then the system complexity remains low, but the manufacturing precision of film thickness and critical dimension deteriorates due to uncontrolled chemical changes
Solution Approach 1:
The patent implements real-time feedback monitoring using IR spectroscopy to detect chemical composition changes in process liquids. The system continuously monitors chemical concentration and provides feedback signals to control systems, enabling dynamic adjustment of processing parameters to maintain film thickness and critical dimension uniformity despite chemical degradation
Solution Approach 2:
The patent introduces IR spectroscopy as an intermediary measurement technique to indirectly monitor chemical composition changes. The IR monitoring system acts as a mediator between the chemical processing system and the control system, translating chemical state into measurable spectral data that can be used for process control
2Reliability
If real-time IR monitoring of process chemicals is implemented, then the manufacturing precision and process control improve, but the device complexity and cost increase
Solution Approach 1:
The patent designs the IR monitoring system to serve multiple functions: chemical composition monitoring, process endpoint detection, and process control. By making the monitoring system multi-functional, the patent reduces the need for separate specialized systems, thereby limiting the increase in overall system complexity while maintaining high reliability
3Loss of time
If process chemicals are monitored continuously in real-time, then the loss of time for process optimization is reduced, but the use of energy and system complexity increase
Solution Approach 1:
The patent implements periodic sampling and monitoring of chemical composition at critical process points rather than continuous monitoring throughout the entire process. This periodic measurement approach reduces energy consumption and data processing requirements while still capturing the essential chemical changes needed for process optimization
Solution Approach 2:
The patent performs preliminary chemical composition analysis before critical process steps to predict and prevent degradation. By monitoring chemicals in advance of potential problems, the system can take corrective action before quality issues arise, reducing the need for extensive real-time intervention and energy consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach provides better process control, improves device performance, and increases yield by ensuring precise monitoring and adjustment of process chemicals in real-time.
Implementation Method 1
The NIR and SWIR spectral ranges are particularly useful for determining the molecular structure of liquid, gas and solid samples using IR spectroscopy
Implementation Method 2
IR spectroscopy is the analysis of the interaction of IR radiation with molecules by absorption, emission or reflection. When a molecule absorbs IR radiation, the absorption causes vibrational transitions in the molecule
Data Source
AI summary
Various embodiments of improved systems and methods are provided herein to monitor process chemicals used in a semiconductor process. More specifically, new semiconductor processing systems and methods that utilize infrared (IR) spectroscopy techniques are provided herein to monitor the composition and/or concentration of process chemicals utilized to process a substrate and/or the by-products produced during substrate processing. By monitoring the process chemicals and/or the by-products in real-time, the systems and methods described herein can be used to provide better process control and/or end-point detection for a wide variety of semiconductor processes.