IR-Transmissive Semiconductor Coating With Visible-UV Absorption

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Solution Overview

Problem

Current methods for depositing conductive coatings in opto-electronic devices, such as OLEDs, face challenges with high evaporation temperatures, accuracy, and debris generation, which affect manufacturing efficiency and cost, particularly when trying to achieve transparent and patterned coatings for improved photon transmission and absorption control across various electromagnetic spectra.

Innovation Solution

A semiconductor device with a discontinuous layer of metal particle structures acting as an electromagnetic radiation-absorbing layer, deposited using a patterning coating that inhibits nucleation, allowing for selective absorption in the visible and UV spectra while maintaining transmission in the IR and NIR spectra, thereby enhancing optical properties and reducing reflection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a fine metal mask (FMM) is used during deposition to form patterned conductive coatings, then pattern accuracy is improved, but manufacturing cost and complexity increase due to high evaporation temperatures and inability to reuse the mask

Engineering Contradiction:
Improvepattern accuracyVSAvoidmanufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent removes the FMM from the deposition process entirely, extracting the masking function and replacing it with a self-patterning mechanism using nucleation-inhibiting coatings and controlled deposition conditions to form patterns without a physical mask

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The mechanical FMM system is replaced with a chemical/physical field-based approach using nucleation-inhibiting coatings and controlled deposition fields to achieve pattern formation through material science mechanisms rather than mechanical masking

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If laser drilling is used to remove unwanted electrode material after deposition, then pattern formation is achieved, but manufacturing yield decreases due to debris generation

Engineering Contradiction:
Improvepattern formationVSAvoidmanufacturing yield
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The pattern is formed during the deposition process itself through nucleation-inhibiting coatings that prevent material deposition in specific areas, rather than forming a complete layer and then removing unwanted portions, thereby avoiding debris generation

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent converts the potential harm of uncontrolled deposition into a benefit by using nucleation-inhibiting coatings to precisely control where deposition occurs, turning what would be waste material into a precise patterning mechanism

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

3Reliability

If conductive coatings are deposited to cover entire electrode areas, then electrical conductivity is improved, but photon transmission is reduced in non-emissive regions

Engineering Contradiction:
Improveelectrical conductivityVSAvoidphoton transmission
Core Design Contradiction:
ReliabilityVSIllumination intensity

Solution Approach 1:

The patent applies different properties to different regions: nucleation-inhibiting coatings are applied selectively to non-emissive regions to allow photon transmission, while emissive regions receive full conductive coating coverage for electrical conductivity

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The deposition parameters are changed locally by using nucleation-inhibiting coatings with specific surface energy characteristics that prevent deposition in non-emissive regions while allowing normal deposition in emissive regions

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables improved photon transmission and absorption control across specific spectra, reducing reflection and enhancing the optical performance, stability, and reliability of opto-electronic devices, while minimizing manufacturing complexities and costs.

Implementation Method 1

the at least one particle structure of the at least one EM radiation-absorbing layer facilitates absorption of EM radiation therein in at least a part of at least one of a visible spectrum and a ultraviolet (UV) spectrum while substantially allowing transmission of EM radiation therein in at least a part of at least one of an IR and an NIR spectrum

Methodology Applied
Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 2

deposited using a patterning coating that inhibits nucleation

Methodology Applied
Scientific EffectNucleation: Nucleation

Data Source

PatentUS20250015510A1Device incorporating an IR signal transmissive region
Publication Date: 2025.01.09 OTI LUMIONICS INC
  • US20250015510A1 patent drawing
  • US20250015510A1 patent drawing
  • US20250015510A1 patent drawing

AI summary

A semiconductor device having a plurality of layers deposited on a substrate and extending in at least one lateral aspect defined by a lateral axis thereof comprises at least one EM radiation-absorbing layer deposited on a first layer surface and comprising a discontinuous layer of at least one particle structure comprising a deposited material. The at least one particle structure of the at least one EM radiation-absorbing layer facilitates absorption of EM radiation therein in at least a part of at least one of a visible spectrum and a UV spectrum while substantially allowing transmission of EM radiation therein in at least a part of at least one of an IR and an NIR spectrum.