IR-Transmissive Semiconductor Coating With Visible-UV Absorption
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Solution Overview
Problem
Current methods for depositing conductive coatings in opto-electronic devices, such as OLEDs, face challenges with high evaporation temperatures, accuracy, and debris generation, which affect manufacturing efficiency and cost, particularly when trying to achieve transparent and patterned coatings for improved photon transmission and absorption control across various electromagnetic spectra.
Innovation Solution
A semiconductor device with a discontinuous layer of metal particle structures acting as an electromagnetic radiation-absorbing layer, deposited using a patterning coating that inhibits nucleation, allowing for selective absorption in the visible and UV spectra while maintaining transmission in the IR and NIR spectra, thereby enhancing optical properties and reducing reflection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a fine metal mask (FMM) is used during deposition to form patterned conductive coatings, then pattern accuracy is improved, but manufacturing cost and complexity increase due to high evaporation temperatures and inability to reuse the mask
Solution Approach 1:
The patent removes the FMM from the deposition process entirely, extracting the masking function and replacing it with a self-patterning mechanism using nucleation-inhibiting coatings and controlled deposition conditions to form patterns without a physical mask
Solution Approach 2:
The mechanical FMM system is replaced with a chemical/physical field-based approach using nucleation-inhibiting coatings and controlled deposition fields to achieve pattern formation through material science mechanisms rather than mechanical masking
2Manufacturing precision
If laser drilling is used to remove unwanted electrode material after deposition, then pattern formation is achieved, but manufacturing yield decreases due to debris generation
Solution Approach 1:
The pattern is formed during the deposition process itself through nucleation-inhibiting coatings that prevent material deposition in specific areas, rather than forming a complete layer and then removing unwanted portions, thereby avoiding debris generation
Solution Approach 2:
The patent converts the potential harm of uncontrolled deposition into a benefit by using nucleation-inhibiting coatings to precisely control where deposition occurs, turning what would be waste material into a precise patterning mechanism
3Reliability
If conductive coatings are deposited to cover entire electrode areas, then electrical conductivity is improved, but photon transmission is reduced in non-emissive regions
Solution Approach 1:
The patent applies different properties to different regions: nucleation-inhibiting coatings are applied selectively to non-emissive regions to allow photon transmission, while emissive regions receive full conductive coating coverage for electrical conductivity
Solution Approach 2:
The deposition parameters are changed locally by using nucleation-inhibiting coatings with specific surface energy characteristics that prevent deposition in non-emissive regions while allowing normal deposition in emissive regions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables improved photon transmission and absorption control across specific spectra, reducing reflection and enhancing the optical performance, stability, and reliability of opto-electronic devices, while minimizing manufacturing complexities and costs.
Implementation Method 1
the at least one particle structure of the at least one EM radiation-absorbing layer facilitates absorption of EM radiation therein in at least a part of at least one of a visible spectrum and a ultraviolet (UV) spectrum while substantially allowing transmission of EM radiation therein in at least a part of at least one of an IR and an NIR spectrum
Implementation Method 2
deposited using a patterning coating that inhibits nucleation
Data Source
AI summary
A semiconductor device having a plurality of layers deposited on a substrate and extending in at least one lateral aspect defined by a lateral axis thereof comprises at least one EM radiation-absorbing layer deposited on a first layer surface and comprising a discontinuous layer of at least one particle structure comprising a deposited material. The at least one particle structure of the at least one EM radiation-absorbing layer facilitates absorption of EM radiation therein in at least a part of at least one of a visible spectrum and a UV spectrum while substantially allowing transmission of EM radiation therein in at least a part of at least one of an IR and an NIR spectrum.


