Island-Bridge Display Structure with Protective-Mask TFT Shielding
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Solution Overview
Problem
Existing display devices, particularly flexible and foldable ones, face challenges in maintaining image quality and structural integrity during stretching or bending due to the vulnerability of thin film transistors and electrodes to ultraviolet light exposure during etching processes, leading to characteristic changes.
Innovation Solution
The use of a protective mask and a reverse tapered flexible substrate design, combined with a backside etching process, to shield thin film transistors from ultraviolet light and maintain structural integrity during manufacturing, ensuring the display device's flexibility and durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a conventional etching process is used on flexible display devices, then the etching can be completed, but ultraviolet light exposure causes characteristic changes in thin film transistors and electrodes
Solution Approach 1:
A protective mask layer is introduced as an intermediary substance between the ultraviolet light source and the thin film transistor. This mask layer absorbs or blocks the ultraviolet light during the etching process, preventing direct exposure to the transistor while allowing the etching to proceed. The mask is subsequently removed after serving its protective function.
Solution Approach 2:
The protective mask layer is formed on the flexible substrate before the etching process begins. This preliminary protective measure ensures that when ultraviolet light is subsequently applied during etching, the thin film transistors are already shielded and cannot suffer characteristic changes from the exposure.
2Adaptability or versatility
If the flexible substrate is made thinner to improve flexibility, then flexibility increases, but structural integrity and protection during manufacturing decrease
Solution Approach 1:
The protective mask layer serves as a cushioning protection applied beforehand during the manufacturing process. This temporary protective layer compensates for the reduced structural strength of the thin flexible substrate, preventing damage during handling and processing. After manufacturing is complete, the mask is removed, leaving the thin but intact flexible substrate.
3Adaptability or versatility
If the display device is designed to be stretchable, then adaptability improves, but vulnerability to ultraviolet light damage increases during manufacturing
Solution Approach 1:
The protective mask acts as an intermediary barrier that specifically addresses the ultraviolet light sensitivity issue. It allows the stretchable display device to be manufactured without exposing the thin film transistors to harmful ultraviolet radiation, while not interfering with the eventual stretchable functionality of the device after the mask is removed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents characteristic changes in thin film transistors and maintains image quality by shielding them from ultraviolet light, enabling a stretchable and durable display device with improved structural integrity.
Implementation Method 1
The use of a protective mask and a reverse tapered flexible substrate design, combined with a backside etching process, to shield thin film transistors from ultraviolet light
Data Source
AI summary
A display device includes a plurality of islands and a bridge connecting the plurality of islands to each other. Each of the plurality of islands includes a flexible substrate, a thin film transistor positioned on a first surface of the flexible substrate, a first electrode connected to the thin film transistor, and a protective mask positioned on a second surface of the flexible substrate.